Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure
This paper presents a simple and feasible method for fabricating high-performance REBa 2 Cu 3 O y (RE123) films. Nd123 films were established on a single-crystalline substrate by the KOH flux method at low temperature and ambient pressure. Above 425 °C, the Nd123 in the obtained films demonstrated s...
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| Veröffentlicht in: | IEEE transactions on applied superconductivity 2016-04, Vol.26 (3), p.1-4 |
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| container_title | IEEE transactions on applied superconductivity |
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| creator | Funaki, Shuhei Yamada, Yasuji Okunishi, Ryota Miyachi, Yugo |
| description | This paper presents a simple and feasible method for fabricating high-performance REBa 2 Cu 3 O y (RE123) films. Nd123 films were established on a single-crystalline substrate by the KOH flux method at low temperature and ambient pressure. Above 425 °C, the Nd123 in the obtained films demonstrated single-phase and biaxial orientation. The T c onset of the Nd123 film was 67.1 K when fabricated at 525 °C but reduced at lower fabrication temperatures, presumably because the Nd became increasingly substituted with Ba. Moreover, the T c onset of the Nd123 film fabricated at 475 °C was enhanced by controlling the Nd/Ba composition ratio in the starting materials. |
| doi_str_mv | 10.1109/TASC.2016.2549050 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_ieee_primary_7445207</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>7445207</ieee_id><sourcerecordid>1816091631</sourcerecordid><originalsourceid>FETCH-LOGICAL-c388t-d205066ace516947b7a507278ff76bde187be288103994cfbf7335d2ddbe404e3</originalsourceid><addsrcrecordid>eNpdkEtLw0AUhYMoWKs_QNwMuHGTOncemcmylFbFagXr1mGS3OBIHnUmwfbfm1Jx4erexXcOhy-KLoFOAGh6u56-ziaMQjJhUqRU0qNoBFLqmEmQx8NPJcSaMX4anYXwSSkILeQoel-23_Ea6w162_UeycJm3uW2c21D2pI8F8A4mW9cZ7fOVmThqjqQbEceV_dkUfVb8oTdR1uQt6ZAT6Z15rDpyIvHEIa68-iktFXAi987jt4W8_XsPl6u7h5m02Wcc627uGDD4iSxOUpIUqEyZSVVTOmyVElWIGiVIdMaKE9TkZdZqTiXBSuKDAUVyMfRzaF349uvHkNnahdyrCrbYNsHAxoSmkLCYUCv_6Gfbe-bYZ0BpRWjnKfJQMGByn0bgsfSbLyrrd8ZoGZv3OyNm71x82t8yFwdMg4R_3glhGRU8R8Xo3p6</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1787203396</pqid></control><display><type>article</type><title>Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure</title><source>IEEE Electronic Library (IEL)</source><creator>Funaki, Shuhei ; Yamada, Yasuji ; Okunishi, Ryota ; Miyachi, Yugo</creator><creatorcontrib>Funaki, Shuhei ; Yamada, Yasuji ; Okunishi, Ryota ; Miyachi, Yugo</creatorcontrib><description>This paper presents a simple and feasible method for fabricating high-performance REBa 2 Cu 3 O y (RE123) films. Nd123 films were established on a single-crystalline substrate by the KOH flux method at low temperature and ambient pressure. Above 425 °C, the Nd123 in the obtained films demonstrated single-phase and biaxial orientation. The T c onset of the Nd123 film was 67.1 K when fabricated at 525 °C but reduced at lower fabrication temperatures, presumably because the Nd became increasingly substituted with Ba. Moreover, the T c onset of the Nd123 film fabricated at 475 °C was enhanced by controlling the Nd/Ba composition ratio in the starting materials.</description><identifier>ISSN: 1051-8223</identifier><identifier>EISSN: 1558-2515</identifier><identifier>DOI: 10.1109/TASC.2016.2549050</identifier><identifier>CODEN: ITASE9</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Critical temperature ; Epitaxial growth ; Epitaxy ; Fabrication ; Flux ; KOH flux method ; Lattices ; Liquid phase epitaxy ; NdBa2Cu3Oy ; Neodymium ; Orientation ; Pressure ; Single crystals ; Substrates ; Superconducting epitaxial layers ; Superconducting film ; Superconducting films ; Superconductivity</subject><ispartof>IEEE transactions on applied superconductivity, 2016-04, Vol.26 (3), p.1-4</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2016</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c388t-d205066ace516947b7a507278ff76bde187be288103994cfbf7335d2ddbe404e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/7445207$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/7445207$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Funaki, Shuhei</creatorcontrib><creatorcontrib>Yamada, Yasuji</creatorcontrib><creatorcontrib>Okunishi, Ryota</creatorcontrib><creatorcontrib>Miyachi, Yugo</creatorcontrib><title>Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure</title><title>IEEE transactions on applied superconductivity</title><addtitle>TASC</addtitle><description>This paper presents a simple and feasible method for fabricating high-performance REBa 2 Cu 3 O y (RE123) films. Nd123 films were established on a single-crystalline substrate by the KOH flux method at low temperature and ambient pressure. Above 425 °C, the Nd123 in the obtained films demonstrated single-phase and biaxial orientation. The T c onset of the Nd123 film was 67.1 K when fabricated at 525 °C but reduced at lower fabrication temperatures, presumably because the Nd became increasingly substituted with Ba. Moreover, the T c onset of the Nd123 film fabricated at 475 °C was enhanced by controlling the Nd/Ba composition ratio in the starting materials.</description><subject>Critical temperature</subject><subject>Epitaxial growth</subject><subject>Epitaxy</subject><subject>Fabrication</subject><subject>Flux</subject><subject>KOH flux method</subject><subject>Lattices</subject><subject>Liquid phase epitaxy</subject><subject>NdBa2Cu3Oy</subject><subject>Neodymium</subject><subject>Orientation</subject><subject>Pressure</subject><subject>Single crystals</subject><subject>Substrates</subject><subject>Superconducting epitaxial layers</subject><subject>Superconducting film</subject><subject>Superconducting films</subject><subject>Superconductivity</subject><issn>1051-8223</issn><issn>1558-2515</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpdkEtLw0AUhYMoWKs_QNwMuHGTOncemcmylFbFagXr1mGS3OBIHnUmwfbfm1Jx4erexXcOhy-KLoFOAGh6u56-ziaMQjJhUqRU0qNoBFLqmEmQx8NPJcSaMX4anYXwSSkILeQoel-23_Ea6w162_UeycJm3uW2c21D2pI8F8A4mW9cZ7fOVmThqjqQbEceV_dkUfVb8oTdR1uQt6ZAT6Z15rDpyIvHEIa68-iktFXAi987jt4W8_XsPl6u7h5m02Wcc627uGDD4iSxOUpIUqEyZSVVTOmyVElWIGiVIdMaKE9TkZdZqTiXBSuKDAUVyMfRzaF349uvHkNnahdyrCrbYNsHAxoSmkLCYUCv_6Gfbe-bYZ0BpRWjnKfJQMGByn0bgsfSbLyrrd8ZoGZv3OyNm71x82t8yFwdMg4R_3glhGRU8R8Xo3p6</recordid><startdate>20160401</startdate><enddate>20160401</enddate><creator>Funaki, Shuhei</creator><creator>Yamada, Yasuji</creator><creator>Okunishi, Ryota</creator><creator>Miyachi, Yugo</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>F28</scope><scope>FR3</scope></search><sort><creationdate>20160401</creationdate><title>Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure</title><author>Funaki, Shuhei ; Yamada, Yasuji ; Okunishi, Ryota ; Miyachi, Yugo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c388t-d205066ace516947b7a507278ff76bde187be288103994cfbf7335d2ddbe404e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>Critical temperature</topic><topic>Epitaxial growth</topic><topic>Epitaxy</topic><topic>Fabrication</topic><topic>Flux</topic><topic>KOH flux method</topic><topic>Lattices</topic><topic>Liquid phase epitaxy</topic><topic>NdBa2Cu3Oy</topic><topic>Neodymium</topic><topic>Orientation</topic><topic>Pressure</topic><topic>Single crystals</topic><topic>Substrates</topic><topic>Superconducting epitaxial layers</topic><topic>Superconducting film</topic><topic>Superconducting films</topic><topic>Superconductivity</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Funaki, Shuhei</creatorcontrib><creatorcontrib>Yamada, Yasuji</creatorcontrib><creatorcontrib>Okunishi, Ryota</creatorcontrib><creatorcontrib>Miyachi, Yugo</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><jtitle>IEEE transactions on applied superconductivity</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Funaki, Shuhei</au><au>Yamada, Yasuji</au><au>Okunishi, Ryota</au><au>Miyachi, Yugo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure</atitle><jtitle>IEEE transactions on applied superconductivity</jtitle><stitle>TASC</stitle><date>2016-04-01</date><risdate>2016</risdate><volume>26</volume><issue>3</issue><spage>1</spage><epage>4</epage><pages>1-4</pages><issn>1051-8223</issn><eissn>1558-2515</eissn><coden>ITASE9</coden><abstract>This paper presents a simple and feasible method for fabricating high-performance REBa 2 Cu 3 O y (RE123) films. Nd123 films were established on a single-crystalline substrate by the KOH flux method at low temperature and ambient pressure. Above 425 °C, the Nd123 in the obtained films demonstrated single-phase and biaxial orientation. The T c onset of the Nd123 film was 67.1 K when fabricated at 525 °C but reduced at lower fabrication temperatures, presumably because the Nd became increasingly substituted with Ba. Moreover, the T c onset of the Nd123 film fabricated at 475 °C was enhanced by controlling the Nd/Ba composition ratio in the starting materials.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TASC.2016.2549050</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
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| subjects | Critical temperature Epitaxial growth Epitaxy Fabrication Flux KOH flux method Lattices Liquid phase epitaxy NdBa2Cu3Oy Neodymium Orientation Pressure Single crystals Substrates Superconducting epitaxial layers Superconducting film Superconducting films Superconductivity |
| title | Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T20%3A09%3A44IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Low-Temperature%20Fabrication%20of%20Nd123%20Epitaxial%20Films%20by%20KOH%20Flux%20Method%20Under%20Ambient%20Pressure&rft.jtitle=IEEE%20transactions%20on%20applied%20superconductivity&rft.au=Funaki,%20Shuhei&rft.date=2016-04-01&rft.volume=26&rft.issue=3&rft.spage=1&rft.epage=4&rft.pages=1-4&rft.issn=1051-8223&rft.eissn=1558-2515&rft.coden=ITASE9&rft_id=info:doi/10.1109/TASC.2016.2549050&rft_dat=%3Cproquest_RIE%3E1816091631%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1787203396&rft_id=info:pmid/&rft_ieee_id=7445207&rfr_iscdi=true |