Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure

This paper presents a simple and feasible method for fabricating high-performance REBa 2 Cu 3 O y (RE123) films. Nd123 films were established on a single-crystalline substrate by the KOH flux method at low temperature and ambient pressure. Above 425 °C, the Nd123 in the obtained films demonstrated single-phase and biaxial orientation. The T c onset of the Nd123 film was 67.1 K when fabricated at 525 °C but reduced at lower fabrication temperatures, presumably because the Nd became increasingly substituted with Ba. Moreover, the T c onset of the Nd123 film fabricated at 475 °C was enhanced by controlling the Nd/Ba composition ratio in the starting materials.