Solution-Based CdS on HfO2 Thin Films for High-Gain and Low-Voltage Unipolar Inverters
We demonstrate low-temperature processed and high-gain unipolar inverters operating at voltages as low as V D = 1 V. A maximum gain for a two-transistor unipolar inverter of 153 was achieved at V D = 5 V with the advantage of using a solution-based n-type semiconductor and an entire fabrication proc...
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Veröffentlicht in: | IEEE transactions on electron devices 2016-04, Vol.63 (4), p.1437-1443 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We demonstrate low-temperature processed and high-gain unipolar inverters operating at voltages as low as V D = 1 V. A maximum gain for a two-transistor unipolar inverter of 153 was achieved at V D = 5 V with the advantage of using a solution-based n-type semiconductor and an entire fabrication process below 150 °C. We evaluate the impact of the gate dielectric thickness on the main thin-film transistor (TFT) parameters and operation voltage. In addition, we compare the conventional MOSFET square-law model indistinctly used in TFTs with a model specifically developed for TFTs. We demonstrate a methodology to model the TFT electrical characteristics and use the extracted parameters in SPICE simulations to evaluate different inverter configurations. Finally, we validate the SPICE simulations with our experiential results. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2016.2532803 |