Examination of electron field emission efficiency and homogeneity from CVD carbon-type films

Examination of electron field emission efficiency and homogeneity from CVD carbon-type films

This paper reports about investigation of electron emission characteristics of carbon-type films grown by an original CVD method on Si and Mo substrates with the diameter 30 mm. It was shown that films have sufficiently high spatial uniformity of emission sites and emission current density exceeds 9...

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Hauptverfasser: Biyablin, A.A., Kandidov, A.V., Pilevskiy, A.A., Rakhimov, A.T., Samorodov, V.A., Seleznev, B.V., Suetin, N.V., Timofeyev, M.A.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Cathodes
Charge coupled devices
Current density
Displays
Electron emission
Fabrication
Nuclear physics
Phosphors
Pulsed power supplies
Semiconductor films
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Beschreibung
Zusammenfassung:This paper reports about investigation of electron emission characteristics of carbon-type films grown by an original CVD method on Si and Mo substrates with the diameter 30 mm. It was shown that films have sufficiently high spatial uniformity of emission sites and emission current density exceeds 900 mA/cm/sup 2/ at the extraction field around 7 V/micron.
DOI:10.1109/IVMC.1998.728735