Performance comparison of differential static CMOS circuit topologies in SOI technology

This paper examines the performance of differential static CMOS circuit topologies based on partially-depleted (PD) and dual-gate SOI devices. Both device types have L/sub eff/=0.15 /spl mu/m. The top and bottom gates of the dual-gate device are self-aligned to the source/drain, and the device has a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Tretz, C., Chuang, C.T., Terman, L., Pelella, M., Zukowski, C.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!