UV-250 patterning of sub-micron tapered active layers

UV-250 patterning of sub-micron tapered active layers

This paper reports the first results on Fabry-Perot 1.3 /spl mu/m lasers with sub-micron tapered active layers defined using a UV-250 patterning technology in combination with conventional RIE processing of InP. Its implementation to the full 2 inch wafer process flow is of interest in low cost modu...

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Hauptverfasser: Tregoat, D., Colson, V., Coquard, J., Le Gouezigou, L., Lestra, A., Pinquier, A., Poingt, F., Fernier, B.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Chemical technology
Costs
Fabry-Perot
Fiber lasers
Laser modes
Optical coupling
Optical device fabrication
Optical fibers
Resists
Waveguide lasers
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Beschreibung
Zusammenfassung:This paper reports the first results on Fabry-Perot 1.3 /spl mu/m lasers with sub-micron tapered active layers defined using a UV-250 patterning technology in combination with conventional RIE processing of InP. Its implementation to the full 2 inch wafer process flow is of interest in low cost module fabrication. Short lasers (500 /spl mu/m) with low coupling loss (3.4 dB with end cleaved fiber) and high quantum efficiency (0.26 W/A at 85/spl deg/C) are demonstrated.
ISSN:1092-8669
DOI:10.1109/ICIPRM.1998.712458