Sequoia: A High-Endurance NVM-Based Cache Architecture

Emerging nonvolatile memory technologies, such as spin-transfer torque RAM or resistive RAM, can increase the capacity of the last-level cache (LLC) in a latency and power-efficient manner. These technologies endure 10 9 -10 12 writes per cell, making a nonvolatile cache (NV-cache) with a lifetime o...

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Veröffentlicht in:IEEE transactions on very large scale integration (VLSI) systems 2016-03, Vol.24 (3), p.954-967
Hauptverfasser: Jokar, Mohammad Reza, Arjomand, Mohammad, Sarbazi-Azad, Hamid
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Sprache:eng
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Zusammenfassung:Emerging nonvolatile memory technologies, such as spin-transfer torque RAM or resistive RAM, can increase the capacity of the last-level cache (LLC) in a latency and power-efficient manner. These technologies endure 10 9 -10 12 writes per cell, making a nonvolatile cache (NV-cache) with a lifetime of dozens of years under ideal working conditions. However, nonuniformity in writes to different cache lines considerably reduces the NV-cache lifetime to a few months. Writes to cache lines can be made uniformly by wear-leveling. A suitable wear-leveling for NV-cache should not incur high storage and performance overheads. We propose a novel, simple, and effective wear-leveling technique with negligible performance overhead of
ISSN:1063-8210
1557-9999
DOI:10.1109/TVLSI.2015.2420954