Sputter deposition of stress controlled piezoelectric AlN and AlScN films for ultrasonic and energy harvesting applications

Sputter deposition of stress controlled piezoelectric AlN and AlScN films for ultrasonic and energy harvesting applications

This paper will report on the deposition and characterization of piezoelectric AlN and Al x Sc 1-x N layers. A special focus is on the characterization regarding the mechanical stress in the films. Potential applications of the films are in ultrasonic microscopy, energy harvesting and SAW/BAW filter...

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Bibliographische Detailangaben
Hauptverfasser: Barth, Stephan, Bartzsch, Hagen, Gloess, Daniel, Frach, Peter, Herzog, Thomas, Walter, Susan, Heuer, Henning
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Acoustics
AlN
AlScN
III-V semiconductor materials
piezoelectric
Sputter Deposition
Sputtering
Stress
Stress Control
Substrates
X-ray scattering
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Beschreibung
Zusammenfassung:This paper will report on the deposition and characterization of piezoelectric AlN and Al x Sc 1-x N layers. A special focus is on the characterization regarding the mechanical stress in the films. Potential applications of the films are in ultrasonic microscopy, energy harvesting and SAW/BAW filters. To demonstrate the potential in ultrasonic applications, the pulse echo method was used.
ISSN:1051-0117
DOI:10.1109/ULTSYM.2013.0344