Characterization of submillimeter-wave Schottky diodes in the 500-750 GHz band using micromachined on-wafer probes

For the first time, direct measurement and characterization of planar Schottky diodes using micromachined on-wafer probes operating from 500 to 750 GHz is described. The Schottky diodes are fabricated on a GaAs substrate and integrated into a coplanar waveguide to allow direct measurement of the dev...

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Hauptverfasser: Hawasli, S. H., Bauwens, M. F., Lichtenberger, A. W., Barker, N. S., Weikle, R. M.
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Barker, N. S.
Weikle, R. M.
description For the first time, direct measurement and characterization of planar Schottky diodes using micromachined on-wafer probes operating from 500 to 750 GHz is described. The Schottky diodes are fabricated on a GaAs substrate and integrated into a coplanar waveguide to allow direct measurement of the device calibrated scattering parameters using CPW probes. The measurements are used to establish and verify equivalent circuit models and parasitics for submillimeter-wave diodes that, previously, were based solely on simulation or scaling of measurements done at microwave frequencies.
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Anodes
Coplanar waveguides
Frequency measurement
Integrated circuit modeling
on-wafer measurement
Probes
scattering parameters
Schottky diodes
Submillimeter-wave
Transmission line measurements
title Characterization of submillimeter-wave Schottky diodes in the 500-750 GHz band using micromachined on-wafer probes
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