Characterization of low frequency noise in nanowire FETs considering variability and quantum effects

Nanowire FETs (NWFETs) having gate-all-around (GAA) structure have been developed due to their novel short channel effect immunity and gate controllability [1]. However, the variability in electrical parameters including the drain current (I d ) and transconductance (g m ) has been observed in such...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Sang-Hyun Lee, Ye-Ram Kim, Jae-Ho Hong, Eui-Young Jeong, Jun-Woo Jang, Jun-Sik Yoon, Dong-Won Kim, Chang-Ki Baek, Jeong-Soo Lee, Yoon-Ha Jeong
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Nanowire FETs (NWFETs) having gate-all-around (GAA) structure have been developed due to their novel short channel effect immunity and gate controllability [1]. However, the variability in electrical parameters including the drain current (I d ) and transconductance (g m ) has been observed in such ultra-scaled channel dimension down to 10 nm [2]. The diameter (dNW) of the channel region has also played an important role to manufacture large scale integrated circuit. At this point, this paper focuses on the variation in dc and noise parameters and characterizes the low frequency noise of the NWFETs considering the quantum effect.
ISSN:1548-3770
2640-6853
DOI:10.1109/DRC.2013.6633824