At speed HTOL test for reliability qualification of high speed mobile applications

In this paper, intuition is given on the Vmin shift behaviors under high speed frequency high temperature operating life (HTOL) stress conditions on Dual- and Quad-Core Application Processors (AP) fabricated with advanced High-k/Metal-gate (HK/MG) process. Unlike a constant frequency at 1 MHz, At Sp...

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Hauptverfasser: Jongwoo Park, Da Ahn, Donghee Lee, Jang, E.-S, Wooyeon Kim, Sangchul Shin, Gunrae Kim, Nae-In Lee, Sangwoo Pae
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:In this paper, intuition is given on the Vmin shift behaviors under high speed frequency high temperature operating life (HTOL) stress conditions on Dual- and Quad-Core Application Processors (AP) fabricated with advanced High-k/Metal-gate (HK/MG) process. Unlike a constant frequency at 1 MHz, At Speed HTOL (ASH) stress tests over 1.5 GHz enables pragmatic Vmin trends. ASH Vmin results represent more realistic Vmin-shift from the viewpoint of both reliability stress and prediction of field EOL. We'll discuss Vmin shift results on ASH and its perspective as the current and future qualification tool for high speed mobile applications.
ISSN:1541-7026
1938-1891
DOI:10.1109/IRPS.2013.6531995