Electrostatic field distribution measurement using silicon micro-mirror array

Electrostatic field distribution measurement using silicon micro-mirror array

Electrostatic field distribution measurement using a silicon micro-mirror array fabricated by Micro-ElectroMechanical Systems (MEMS) process has been presented. The deflection of each micro-mirror by electrostatic field was measured optically using a two-dimensional optical scanner and a position se...

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Hauptverfasser: Kuriyama, T., Aoi, T., Takatsuji, W., Maeda, H., Itoh, T., Ueno, Y., Nakaie, T., Matsui, J., Miyamoto, Y.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Electrostatic measurements
Electrostatics
Laser beams
Measurement by laser beam
Mirrors
Optical variables measurement
Voltage measurement
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Zusammenfassung:Electrostatic field distribution measurement using a silicon micro-mirror array fabricated by Micro-ElectroMechanical Systems (MEMS) process has been presented. The deflection of each micro-mirror by electrostatic field was measured optically using a two-dimensional optical scanner and a position sensitive detector (PSD). The obtained electrostatic data showed good agreement with Coulomb's law and the system was applied to a human body model.
ISSN:2158-110X
2158-1118
DOI:10.1109/ISEMC.2012.6351823