Advanced IC technologies I

Advanced IC technologies I

This all-Invited session covers advanced technologies, including the first production tri-gate devices, ultra-thin SOI, reliability challenges for scaled CMOS, and SiC devices for power management.

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Hauptverfasser: Loke, Alvin, Sunderland, David
Format: Tagungsbericht
Sprache:eng
Schlagworte:
CMOS integrated circuits
CMOS technology
High K dielectric materials
Integrated circuit reliability
Silicon carbide
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creator Loke, Alvin
Sunderland, David
description This all-Invited session covers advanced technologies, including the first production tri-gate devices, ultra-thin SOI, reliability challenges for scaled CMOS, and SiC devices for power management.
doi_str_mv 10.1109/CICC.2012.6330656
format Conference Proceeding
fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_6330656</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>6330656</ieee_id><sourcerecordid>6330656</sourcerecordid><originalsourceid>FETCH-ieee_primary_63306563</originalsourceid><addsrcrecordid>eNp9zr0OgjAUQOHrXyIoD6AuvAB4b0tLO5oGI7s7IVAVg2CoMfHtXXB1OsO3HIANYUyEem9yY2KGxGLJOUohJ-BTIlNOQiQ4BY-RYBGXHGcQ6FT9TIg5eKiUjITmuATfuTsiaa2YB9tD_S67ytZhbsKXrW5d3_bXxrowX8PiUrbOBmNXsDtmZ3OKGmtt8RyaRzl8ivGF_9cvPBQvqw</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Advanced IC technologies I</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Loke, Alvin ; Sunderland, David</creator><creatorcontrib>Loke, Alvin ; Sunderland, David</creatorcontrib><description>This all-Invited session covers advanced technologies, including the first production tri-gate devices, ultra-thin SOI, reliability challenges for scaled CMOS, and SiC devices for power management.</description><identifier>ISSN: 0886-5930</identifier><identifier>ISBN: 9781467315555</identifier><identifier>ISBN: 1467315559</identifier><identifier>EISSN: 2152-3630</identifier><identifier>EISBN: 1467315540</identifier><identifier>EISBN: 9781467315562</identifier><identifier>EISBN: 9781467315548</identifier><identifier>EISBN: 1467315567</identifier><identifier>DOI: 10.1109/CICC.2012.6330656</identifier><language>eng</language><publisher>IEEE</publisher><subject>CMOS integrated circuits ; CMOS technology ; High K dielectric materials ; Integrated circuit reliability ; Silicon carbide</subject><ispartof>Proceedings of the IEEE 2012 Custom Integrated Circuits Conference, 2012, p.1-1</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6330656$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,777,781,786,787,2052,27906,54901</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/6330656$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Loke, Alvin</creatorcontrib><creatorcontrib>Sunderland, David</creatorcontrib><title>Advanced IC technologies I</title><title>Proceedings of the IEEE 2012 Custom Integrated Circuits Conference</title><addtitle>CICC</addtitle><description>This all-Invited session covers advanced technologies, including the first production tri-gate devices, ultra-thin SOI, reliability challenges for scaled CMOS, and SiC devices for power management.</description><subject>CMOS integrated circuits</subject><subject>CMOS technology</subject><subject>High K dielectric materials</subject><subject>Integrated circuit reliability</subject><subject>Silicon carbide</subject><issn>0886-5930</issn><issn>2152-3630</issn><isbn>9781467315555</isbn><isbn>1467315559</isbn><isbn>1467315540</isbn><isbn>9781467315562</isbn><isbn>9781467315548</isbn><isbn>1467315567</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2012</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9zr0OgjAUQOHrXyIoD6AuvAB4b0tLO5oGI7s7IVAVg2CoMfHtXXB1OsO3HIANYUyEem9yY2KGxGLJOUohJ-BTIlNOQiQ4BY-RYBGXHGcQ6FT9TIg5eKiUjITmuATfuTsiaa2YB9tD_S67ytZhbsKXrW5d3_bXxrowX8PiUrbOBmNXsDtmZ3OKGmtt8RyaRzl8ivGF_9cvPBQvqw</recordid><startdate>201209</startdate><enddate>201209</enddate><creator>Loke, Alvin</creator><creator>Sunderland, David</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>201209</creationdate><title>Advanced IC technologies I</title><author>Loke, Alvin ; Sunderland, David</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_63306563</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2012</creationdate><topic>CMOS integrated circuits</topic><topic>CMOS technology</topic><topic>High K dielectric materials</topic><topic>Integrated circuit reliability</topic><topic>Silicon carbide</topic><toplevel>online_resources</toplevel><creatorcontrib>Loke, Alvin</creatorcontrib><creatorcontrib>Sunderland, David</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Loke, Alvin</au><au>Sunderland, David</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Advanced IC technologies I</atitle><btitle>Proceedings of the IEEE 2012 Custom Integrated Circuits Conference</btitle><stitle>CICC</stitle><date>2012-09</date><risdate>2012</risdate><spage>1</spage><epage>1</epage><pages>1-1</pages><issn>0886-5930</issn><eissn>2152-3630</eissn><isbn>9781467315555</isbn><isbn>1467315559</isbn><eisbn>1467315540</eisbn><eisbn>9781467315562</eisbn><eisbn>9781467315548</eisbn><eisbn>1467315567</eisbn><abstract>This all-Invited session covers advanced technologies, including the first production tri-gate devices, ultra-thin SOI, reliability challenges for scaled CMOS, and SiC devices for power management.</abstract><pub>IEEE</pub><doi>10.1109/CICC.2012.6330656</doi></addata></record>
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identifier ISSN: 0886-5930
ispartof Proceedings of the IEEE 2012 Custom Integrated Circuits Conference, 2012, p.1-1
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2152-3630
language eng
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects CMOS integrated circuits
CMOS technology
High K dielectric materials
Integrated circuit reliability
Silicon carbide
title Advanced IC technologies I
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T04%3A51%3A44IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Advanced%20IC%20technologies%20I&rft.btitle=Proceedings%20of%20the%20IEEE%202012%20Custom%20Integrated%20Circuits%20Conference&rft.au=Loke,%20Alvin&rft.date=2012-09&rft.spage=1&rft.epage=1&rft.pages=1-1&rft.issn=0886-5930&rft.eissn=2152-3630&rft.isbn=9781467315555&rft.isbn_list=1467315559&rft_id=info:doi/10.1109/CICC.2012.6330656&rft_dat=%3Cieee_6IE%3E6330656%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&rft.eisbn=1467315540&rft.eisbn_list=9781467315562&rft.eisbn_list=9781467315548&rft.eisbn_list=1467315567&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=6330656&rfr_iscdi=true