Near Field-Emission SEM: Primary electron beam generation and comparison with STM

Near Field-Emission SEM: Primary electron beam generation and comparison with STM

In Near Field-Emission Scanning Electron Microscopy the source of the primary beam is only few tens nm away from the target. We report the progress in primary beam generation and compare the performance of the instrument in field emission mode with respect to the well-established Scanning Tunneling...

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Bibliographische Detailangaben
Hauptverfasser: Zanin, D. A., Cabrera, H., De Pietro, L. G., Thalmann, M., Pescia, D., Ramsperger, U.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Apertures
Contamination
Electron beams
Field-Emission
NFESEM
Scanning electron microscopy
STM
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Beschreibung
Zusammenfassung:In Near Field-Emission Scanning Electron Microscopy the source of the primary beam is only few tens nm away from the target. We report the progress in primary beam generation and compare the performance of the instrument in field emission mode with respect to the well-established Scanning Tunneling Microscopy (STM).
ISSN:2164-2370
DOI:10.1109/IVNC.2012.6316839