First demonstration of AlInN/GaN HEMTs amplifiers at K band

AlInN/GaN HEMTs have shown outstanding power performances for high frequency applications, due in particular to their high current densities and their thinner barrier layers than in AlGaN/GaN HEMTs that minimize short channel effects. In this paper, we present the first published power results of tw...

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Hauptverfasser: Jardel, O., Callet, G., Lancereau, D., Jacquet, J-C., Reveyrand, T., Sarazin, N., Aubry, R., Leger, S., Chartier, E., Oualli, M., Dua, C., Piotrowicz, S., Morvan, E., Di Forte Poisson, M.A., Delage, S.L.
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:AlInN/GaN HEMTs have shown outstanding power performances for high frequency applications, due in particular to their high current densities and their thinner barrier layers than in AlGaN/GaN HEMTs that minimize short channel effects. In this paper, we present the first published power results of two K-band hybrid amplifier demonstrators at 20GHz and 26.5GHz using 0.25µm gate length devices. At these frequencies, respectively, cw RF output power of 4.5 Watts with 20% PAE and 1.65 W with 15.5 % of PAE were obtained. These state-of-the-art results confirm the potential of AlInN/GaN technology for high frequency applications.
ISSN:0149-645X
2576-7216
DOI:10.1109/MWSYM.2012.6259551