Characterization and modelling of Si-substrate noise induced by RF signal propagating in TSV of 3D-IC stack

TSVs in 3D integrated circuits are a source of noise that can affect nearby transistor performance. So an analytical physics-based model of the TSV-to-substrate coupling is proposed to perform time domain or noise simulations. Silicon measurements at low frequencies and radiofrequencies are reported...

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Hauptverfasser: Brocard, M., Le Maitre, P., Bermond, C., Bar, P., Anciant, R., Farcy, A., Lacrevaz, T., Leduc, P., Coudrain, P., Hotellier, N., Ben Jamaa, H., Cheramy, S., Sillon, N., Marin, J., Flechet, B.
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creator Brocard, M.
Le Maitre, P.
Bermond, C.
Bar, P.
Anciant, R.
Farcy, A.
Lacrevaz, T.
Leduc, P.
Coudrain, P.
Hotellier, N.
Ben Jamaa, H.
Cheramy, S.
Sillon, N.
Marin, J.
Flechet, B.
description TSVs in 3D integrated circuits are a source of noise that can affect nearby transistor performance. So an analytical physics-based model of the TSV-to-substrate coupling is proposed to perform time domain or noise simulations. Silicon measurements at low frequencies and radiofrequencies are reported. Simulations are done using a software performing device and electromagnetic co-simulations. The model and simulations are validated by measurements. Simulations to study the sensitivity of the TSV structure to the layout show changes in the TSV-to-substrate coupling behavior.
doi_str_mv 10.1109/ECTC.2012.6248903
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Capacitance
Frequency measurement
Integrated circuit modeling
Semiconductor device modeling
Silicon
Substrates
Through-silicon vias
title Characterization and modelling of Si-substrate noise induced by RF signal propagating in TSV of 3D-IC stack
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