Characterization and modelling of Si-substrate noise induced by RF signal propagating in TSV of 3D-IC stack
TSVs in 3D integrated circuits are a source of noise that can affect nearby transistor performance. So an analytical physics-based model of the TSV-to-substrate coupling is proposed to perform time domain or noise simulations. Silicon measurements at low frequencies and radiofrequencies are reported...
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creator | Brocard, M. Le Maitre, P. Bermond, C. Bar, P. Anciant, R. Farcy, A. Lacrevaz, T. Leduc, P. Coudrain, P. Hotellier, N. Ben Jamaa, H. Cheramy, S. Sillon, N. Marin, J. Flechet, B. |
description | TSVs in 3D integrated circuits are a source of noise that can affect nearby transistor performance. So an analytical physics-based model of the TSV-to-substrate coupling is proposed to perform time domain or noise simulations. Silicon measurements at low frequencies and radiofrequencies are reported. Simulations are done using a software performing device and electromagnetic co-simulations. The model and simulations are validated by measurements. Simulations to study the sensitivity of the TSV structure to the layout show changes in the TSV-to-substrate coupling behavior. |
doi_str_mv | 10.1109/ECTC.2012.6248903 |
format | Conference Proceeding |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Capacitance Frequency measurement Integrated circuit modeling Semiconductor device modeling Silicon Substrates Through-silicon vias |
title | Characterization and modelling of Si-substrate noise induced by RF signal propagating in TSV of 3D-IC stack |
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