InAlN/AlN/GaN HEMTs With Regrown Ohmic Contacts and f of 370 GHz
We report 30-nm-gate-length InAlN/AlN/GaN/SiC high-electron-mobility transistors (HEMTs) with a record current gain cutoff frequency ( fT ) of 370 GHz. The HEMT without back barrier exhibits an extrinsic transconductance ( g m.ext ) of 650 mS/mm and an on/off current ratio of 10 6 owing to the incor...
Gespeichert in:
Veröffentlicht in: | IEEE electron device letters 2012-07, Vol.33 (7), p.988-990 |
---|---|
Hauptverfasser: | , , , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | We report 30-nm-gate-length InAlN/AlN/GaN/SiC high-electron-mobility transistors (HEMTs) with a record current gain cutoff frequency ( fT ) of 370 GHz. The HEMT without back barrier exhibits an extrinsic transconductance ( g m.ext ) of 650 mS/mm and an on/off current ratio of 10 6 owing to the incorporation of dielectric-free passivation and regrown ohmic contacts with a contact resistance of 0.16 Ω·mm. Delay analysis suggests that the high fT is a result of low gate-drain parasitics associated with the rectangular gate. Although it appears possible to reach 500-GHz fT by further reducing the gate length, it is imperative to investigate alternative structures that offer higher mobility/velocity while keeping the best possible electrostatic control in ultrascaled geometry. |
---|---|
ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/LED.2012.2196751 |