InAlN/AlN/GaN HEMTs With Regrown Ohmic Contacts and f of 370 GHz

We report 30-nm-gate-length InAlN/AlN/GaN/SiC high-electron-mobility transistors (HEMTs) with a record current gain cutoff frequency ( fT ) of 370 GHz. The HEMT without back barrier exhibits an extrinsic transconductance ( g m.ext ) of 650 mS/mm and an on/off current ratio of 10 6 owing to the incor...

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Veröffentlicht in:IEEE electron device letters 2012-07, Vol.33 (7), p.988-990
Hauptverfasser: Yuanzheng Yue, Zongyang Hu, Jia Guo, Sensale-Rodriguez, B., Guowang Li, Ronghua Wang, Faria, F., Tian Fang, Bo Song, Xiang Gao, Shiping Guo, Kosel, T., Snider, G., Fay, P., Jena, D., Huili Xing
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Sprache:eng
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Zusammenfassung:We report 30-nm-gate-length InAlN/AlN/GaN/SiC high-electron-mobility transistors (HEMTs) with a record current gain cutoff frequency ( fT ) of 370 GHz. The HEMT without back barrier exhibits an extrinsic transconductance ( g m.ext ) of 650 mS/mm and an on/off current ratio of 10 6 owing to the incorporation of dielectric-free passivation and regrown ohmic contacts with a contact resistance of 0.16 Ω·mm. Delay analysis suggests that the high fT is a result of low gate-drain parasitics associated with the rectangular gate. Although it appears possible to reach 500-GHz fT by further reducing the gate length, it is imperative to investigate alternative structures that offer higher mobility/velocity while keeping the best possible electrostatic control in ultrascaled geometry.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2012.2196751