Planar GeOI TFET Performance Improvement With Back Biasing

Reverse back biasing of a planar germanium-on-insulator tunneling field-effect transistor provides for significant improvement in I ON / I OFF , by over an order of magnitude for 0.25 V operating voltage. Optimization of the gate-to-source overlap and source doping gradient is key to maximizing the...

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Veröffentlicht in:IEEE transactions on electron devices 2012-06, Vol.59 (6), p.1629-1635
Hauptverfasser: Matheu, P., Byron Ho, Jacobson, Z. A., Tsu-Jae King Liu
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container_title IEEE transactions on electron devices
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creator Matheu, P.
Byron Ho
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Tsu-Jae King Liu
description Reverse back biasing of a planar germanium-on-insulator tunneling field-effect transistor provides for significant improvement in I ON / I OFF , by over an order of magnitude for 0.25 V operating voltage. Optimization of the gate-to-source overlap and source doping gradient is key to maximizing the benefit of back biasing.
doi_str_mv 10.1109/TED.2012.2191410
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source IEEE Electronic Library (IEL)
subjects Applied sciences
Doping
Electrodes
Electronics
Exact sciences and technology
Germanium-on-insulator (GeOI)
Junctions
Logic gates
MOSFET circuits
reverse back bias
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Silicon
Transistors
Tunneling
tunneling FET (TFET)
title Planar GeOI TFET Performance Improvement With Back Biasing
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