Planar GeOI TFET Performance Improvement With Back Biasing
Reverse back biasing of a planar germanium-on-insulator tunneling field-effect transistor provides for significant improvement in I ON / I OFF , by over an order of magnitude for 0.25 V operating voltage. Optimization of the gate-to-source overlap and source doping gradient is key to maximizing the...
Gespeichert in:
Veröffentlicht in: | IEEE transactions on electron devices 2012-06, Vol.59 (6), p.1629-1635 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 1635 |
---|---|
container_issue | 6 |
container_start_page | 1629 |
container_title | IEEE transactions on electron devices |
container_volume | 59 |
creator | Matheu, P. Byron Ho Jacobson, Z. A. Tsu-Jae King Liu |
description | Reverse back biasing of a planar germanium-on-insulator tunneling field-effect transistor provides for significant improvement in I ON / I OFF , by over an order of magnitude for 0.25 V operating voltage. Optimization of the gate-to-source overlap and source doping gradient is key to maximizing the benefit of back biasing. |
doi_str_mv | 10.1109/TED.2012.2191410 |
format | Article |
fullrecord | <record><control><sourceid>pascalfrancis_RIE</sourceid><recordid>TN_cdi_ieee_primary_6187725</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>6187725</ieee_id><sourcerecordid>25949260</sourcerecordid><originalsourceid>FETCH-LOGICAL-c293t-f72f2d9b1ac1b7eb06da1af9a7a7a7c39823c8f84c690f9eb84e753506d33ef13</originalsourceid><addsrcrecordid>eNo9j01LAzEQhoMoWKt3wUsuHrdmkmw-vNkP60KhPVQ8Ltl0oqvdbUmK4L93l5Yyh2F432fgIeQe2AiA2af1bDriDPiIgwUJ7IIMIM91ZpVUl2TAGJjMCiOuyU1K392ppOQD8rzautZFOsdlQdevszVdYQy72LjWIy2afdz9YoPtgX7Uhy86dv6HjmuX6vbzllwFt014d9pD8t7xk7dssZwXk5dF5rkVhyxoHvjGVuA8VBorpjYOXLBO9-OFNVx4E4z0yrJgsTISdS7yricEBhBDwo5_fdylFDGU-1g3Lv6VwMrevezcy969PLl3yOMR2bvk3TbEzqZOZ47nVlqu-t7DsVcj4jlWYLTmufgHrplg7g</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Planar GeOI TFET Performance Improvement With Back Biasing</title><source>IEEE Electronic Library (IEL)</source><creator>Matheu, P. ; Byron Ho ; Jacobson, Z. A. ; Tsu-Jae King Liu</creator><creatorcontrib>Matheu, P. ; Byron Ho ; Jacobson, Z. A. ; Tsu-Jae King Liu</creatorcontrib><description>Reverse back biasing of a planar germanium-on-insulator tunneling field-effect transistor provides for significant improvement in I ON / I OFF , by over an order of magnitude for 0.25 V operating voltage. Optimization of the gate-to-source overlap and source doping gradient is key to maximizing the benefit of back biasing.</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/TED.2012.2191410</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Doping ; Electrodes ; Electronics ; Exact sciences and technology ; Germanium-on-insulator (GeOI) ; Junctions ; Logic gates ; MOSFET circuits ; reverse back bias ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Silicon ; Transistors ; Tunneling ; tunneling FET (TFET)</subject><ispartof>IEEE transactions on electron devices, 2012-06, Vol.59 (6), p.1629-1635</ispartof><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c293t-f72f2d9b1ac1b7eb06da1af9a7a7a7c39823c8f84c690f9eb84e753506d33ef13</citedby><cites>FETCH-LOGICAL-c293t-f72f2d9b1ac1b7eb06da1af9a7a7a7c39823c8f84c690f9eb84e753506d33ef13</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6187725$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/6187725$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=25949260$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Matheu, P.</creatorcontrib><creatorcontrib>Byron Ho</creatorcontrib><creatorcontrib>Jacobson, Z. A.</creatorcontrib><creatorcontrib>Tsu-Jae King Liu</creatorcontrib><title>Planar GeOI TFET Performance Improvement With Back Biasing</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>Reverse back biasing of a planar germanium-on-insulator tunneling field-effect transistor provides for significant improvement in I ON / I OFF , by over an order of magnitude for 0.25 V operating voltage. Optimization of the gate-to-source overlap and source doping gradient is key to maximizing the benefit of back biasing.</description><subject>Applied sciences</subject><subject>Doping</subject><subject>Electrodes</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Germanium-on-insulator (GeOI)</subject><subject>Junctions</subject><subject>Logic gates</subject><subject>MOSFET circuits</subject><subject>reverse back bias</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Silicon</subject><subject>Transistors</subject><subject>Tunneling</subject><subject>tunneling FET (TFET)</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNo9j01LAzEQhoMoWKt3wUsuHrdmkmw-vNkP60KhPVQ8Ltl0oqvdbUmK4L93l5Yyh2F432fgIeQe2AiA2af1bDriDPiIgwUJ7IIMIM91ZpVUl2TAGJjMCiOuyU1K392ppOQD8rzautZFOsdlQdevszVdYQy72LjWIy2afdz9YoPtgX7Uhy86dv6HjmuX6vbzllwFt014d9pD8t7xk7dssZwXk5dF5rkVhyxoHvjGVuA8VBorpjYOXLBO9-OFNVx4E4z0yrJgsTISdS7yricEBhBDwo5_fdylFDGU-1g3Lv6VwMrevezcy969PLl3yOMR2bvk3TbEzqZOZ47nVlqu-t7DsVcj4jlWYLTmufgHrplg7g</recordid><startdate>20120601</startdate><enddate>20120601</enddate><creator>Matheu, P.</creator><creator>Byron Ho</creator><creator>Jacobson, Z. A.</creator><creator>Tsu-Jae King Liu</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20120601</creationdate><title>Planar GeOI TFET Performance Improvement With Back Biasing</title><author>Matheu, P. ; Byron Ho ; Jacobson, Z. A. ; Tsu-Jae King Liu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c293t-f72f2d9b1ac1b7eb06da1af9a7a7a7c39823c8f84c690f9eb84e753506d33ef13</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Applied sciences</topic><topic>Doping</topic><topic>Electrodes</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Germanium-on-insulator (GeOI)</topic><topic>Junctions</topic><topic>Logic gates</topic><topic>MOSFET circuits</topic><topic>reverse back bias</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Silicon</topic><topic>Transistors</topic><topic>Tunneling</topic><topic>tunneling FET (TFET)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Matheu, P.</creatorcontrib><creatorcontrib>Byron Ho</creatorcontrib><creatorcontrib>Jacobson, Z. A.</creatorcontrib><creatorcontrib>Tsu-Jae King Liu</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Matheu, P.</au><au>Byron Ho</au><au>Jacobson, Z. A.</au><au>Tsu-Jae King Liu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Planar GeOI TFET Performance Improvement With Back Biasing</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2012-06-01</date><risdate>2012</risdate><volume>59</volume><issue>6</issue><spage>1629</spage><epage>1635</epage><pages>1629-1635</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>Reverse back biasing of a planar germanium-on-insulator tunneling field-effect transistor provides for significant improvement in I ON / I OFF , by over an order of magnitude for 0.25 V operating voltage. Optimization of the gate-to-source overlap and source doping gradient is key to maximizing the benefit of back biasing.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/TED.2012.2191410</doi><tpages>7</tpages></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | ISSN: 0018-9383 |
ispartof | IEEE transactions on electron devices, 2012-06, Vol.59 (6), p.1629-1635 |
issn | 0018-9383 1557-9646 |
language | eng |
recordid | cdi_ieee_primary_6187725 |
source | IEEE Electronic Library (IEL) |
subjects | Applied sciences Doping Electrodes Electronics Exact sciences and technology Germanium-on-insulator (GeOI) Junctions Logic gates MOSFET circuits reverse back bias Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Silicon Transistors Tunneling tunneling FET (TFET) |
title | Planar GeOI TFET Performance Improvement With Back Biasing |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T11%3A46%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-pascalfrancis_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Planar%20GeOI%20TFET%20Performance%20Improvement%20With%20Back%20Biasing&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Matheu,%20P.&rft.date=2012-06-01&rft.volume=59&rft.issue=6&rft.spage=1629&rft.epage=1635&rft.pages=1629-1635&rft.issn=0018-9383&rft.eissn=1557-9646&rft.coden=IETDAI&rft_id=info:doi/10.1109/TED.2012.2191410&rft_dat=%3Cpascalfrancis_RIE%3E25949260%3C/pascalfrancis_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=6187725&rfr_iscdi=true |