THz transmission spectroscopy to study the oxidation kinetics of nanometer thick copper films

THz transmission spectroscopy to study the oxidation kinetics of nanometer thick copper films

We present a new non-contact method for in-situ monitoring of oxidation of nanometer thick copper films using THz - time domain spectroscopy. The transmission of THz pulses through copper films during oxidation at temperatures around 140°C is measured in ambient air.

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Ramanandan, K. P. G., Planken, P. C. M.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Copper
Oxidation
Silicon
Spectroscopy
Temperature measurement
Thickness measurement
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We present a new non-contact method for in-situ monitoring of oxidation of nanometer thick copper films using THz - time domain spectroscopy. The transmission of THz pulses through copper films during oxidation at temperatures around 140°C is measured in ambient air.
ISSN:2162-2027
DOI:10.1109/irmmw-THz.2011.6104811