Design intent utilization for lithography compliance check and layout refinement to improve manufacturability

Design intent utilization for lithography compliance check and layout refinement to improve manufacturability

A collection of slides from the authors conference presentation about the design intent utilization for lithography compliance check and layout refinement to improve manufacturability is presented.

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Bibliographische Detailangaben
Hauptverfasser: Kobayashi, S., Ikeuchi, A., Kimura, K., Kotani, T., Tanaka, S., Suigen Kyoh, Maeda, S., Inoue, S.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Data mining
Design methodology
Lithography
Loss measurement
Timing
Wires
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Beschreibung
Zusammenfassung:A collection of slides from the authors conference presentation about the design intent utilization for lithography compliance check and layout refinement to improve manufacturability is presented.
ISSN:1523-553X