Bolometer at semiconductor-metal phase transition in VO2 thin films

Bolometer at semiconductor-metal phase transition in VO2 thin films

A double ion beam sputtering deposition method was used for fabricating bolometric structure based on poly-crystalline VO 2 film. A sensitivity of bolometric structure to infrared (IR) radiation at semiconductor-metal phase transition (SMPT) was observed. It has been established that temperature coe...

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Bibliographische Detailangaben
Hauptverfasser: Aliev, V. S., Bortnikov, S. G.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
bolometer
Bolometers
Heating
Hysteresis
infrared radiation
phase transition semiconductor-metal
Resistance
Temperature measurement
Temperature sensors
VO 2 thin films
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Beschreibung
Zusammenfassung:A double ion beam sputtering deposition method was used for fabricating bolometric structure based on poly-crystalline VO 2 film. A sensitivity of bolometric structure to infrared (IR) radiation at semiconductor-metal phase transition (SMPT) was observed. It has been established that temperature coefficient of resistance (TCR) in phase transition region is 10 times higher of such value at room temperature and resistance of bolometric structure is 25 times lower.
ISSN:1815-3712
DOI:10.1109/EDM.2011.6006913