The quantum confinement effect of InGaN/GaN nanorods by photoelectrochemical oxidation
In this study, the nanorods of 100-150nm diameter on an InGaN/GaN multi quantum well (MQW) structure were fabricated using self-assembled nickel metal nanomasks and inductively coupled plasma reactive ion etching. The photoelectron-chemical (PEC) methods were applied to oxidate the InGaN/GaN MQWs na...
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Format: | Tagungsbericht |
Sprache: | eng |
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Zusammenfassung: | In this study, the nanorods of 100-150nm diameter on an InGaN/GaN multi quantum well (MQW) structure were fabricated using self-assembled nickel metal nanomasks and inductively coupled plasma reactive ion etching. The photoelectron-chemical (PEC) methods were applied to oxidate the InGaN/GaN MQWs nanorods. After 5V/80min oxidation, the measured PL from the embedded InGaN/GaN MQWs shows an energy shift of 30meV and a smaller QCSE, which are caused by quantum confinement effect and the strain relaxation of MQWs. The blue shift range increased with decreasing MQWs diameter. |
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ISSN: | 2159-3523 |
DOI: | 10.1109/INEC.2011.5991695 |