The quantum confinement effect of InGaN/GaN nanorods by photoelectrochemical oxidation

In this study, the nanorods of 100-150nm diameter on an InGaN/GaN multi quantum well (MQW) structure were fabricated using self-assembled nickel metal nanomasks and inductively coupled plasma reactive ion etching. The photoelectron-chemical (PEC) methods were applied to oxidate the InGaN/GaN MQWs na...

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Hauptverfasser: Woei-Tyng Lin, Fang-I Lai, Shou-Yi Kuo, Shao-Chun Huang
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:In this study, the nanorods of 100-150nm diameter on an InGaN/GaN multi quantum well (MQW) structure were fabricated using self-assembled nickel metal nanomasks and inductively coupled plasma reactive ion etching. The photoelectron-chemical (PEC) methods were applied to oxidate the InGaN/GaN MQWs nanorods. After 5V/80min oxidation, the measured PL from the embedded InGaN/GaN MQWs shows an energy shift of 30meV and a smaller QCSE, which are caused by quantum confinement effect and the strain relaxation of MQWs. The blue shift range increased with decreasing MQWs diameter.
ISSN:2159-3523
DOI:10.1109/INEC.2011.5991695