A versatile 30V analog CMOS process in a 0.18μm technology for power management application
A versatile 30V analog CMOS process in a 0.18 μm technology node has been developed by using cost-effective and modular fashion. To reduce the thermal budget deep NWELL isolation is formed after CMOS well formation. The drain-extended (DE) CMOS from 7V to 30V shows very competitive trade-off perform...
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creator | Yong-Keon Choi Il-Yong Park Hyun-Chol Lim Mi-Young Kim Chul-Jin Yoon Nam-Joo Kim Kwang-Dong Yoo Hutter, L. N. |
description | A versatile 30V analog CMOS process in a 0.18 μm technology node has been developed by using cost-effective and modular fashion. To reduce the thermal budget deep NWELL isolation is formed after CMOS well formation. The drain-extended (DE) CMOS from 7V to 30V shows very competitive trade-off performance between the breakdown voltage and the specific on-resistance. In addition, low 1/f noise of 5V CMOS can be obtained by pure gate oxide process. |
doi_str_mv | 10.1109/ISPSD.2011.5890830 |
format | Conference Proceeding |
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identifier | ISSN: 1063-6854 |
ispartof | 2011 IEEE 23rd International Symposium on Power Semiconductor Devices and ICs, 2011, p.219-222 |
issn | 1063-6854 1946-0201 |
language | eng |
recordid | cdi_ieee_primary_5890830 |
source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Analog circuits CMOS integrated circuits CMOS technology EPROM Logic gates Noise Transistors |
title | A versatile 30V analog CMOS process in a 0.18μm technology for power management application |
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