Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation
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| creator | Booske, J.H. Zhan, L. Cooper, R.F. Shohet, J.L. Shenai, K. Dallman, D. Goeckner, M.J. Breun, R. Hitchon, W.N.G. Wickesberg, E. Speth, R. Jacobs, J.R. Was, G. |
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| doi_str_mv | 10.1109/PLASMA.1994.588985 |
| format | Conference Proceeding |
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Zhan, L. ; Cooper, R.F. ; Shohet, J.L. ; Shenai, K. ; Dallman, D. ; Goeckner, M.J. ; Breun, R. ; Hitchon, W.N.G. ; Wickesberg, E. ; Speth, R. ; Jacobs, J.R. ; Was, G.</creator><creatorcontrib>Booske, J.H. ; Zhan, L. ; Cooper, R.F. ; Shohet, J.L. ; Shenai, K. ; Dallman, D. ; Goeckner, M.J. ; Breun, R. ; Hitchon, W.N.G. ; Wickesberg, E. ; Speth, R. ; Jacobs, J.R. ; Was, G.</creatorcontrib><identifier>ISSN: 0730-9244</identifier><identifier>ISBN: 0780320069</identifier><identifier>ISBN: 9780780320062</identifier><identifier>EISSN: 2576-7208</identifier><identifier>DOI: 10.1109/PLASMA.1994.588985</identifier><language>eng</language><publisher>IEEE</publisher><subject>Ceramics ; CMOS technology ; DNA ; Electron beams ; Flue gases ; Glass ; Ion implantation ; Plasma sources ; Silicon ; Surface treatment</subject><ispartof>Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS), 1994, p.166-166</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/588985$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,777,781,786,787,2052,4036,4037,27906,54901</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/588985$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Booske, J.H.</creatorcontrib><creatorcontrib>Zhan, L.</creatorcontrib><creatorcontrib>Cooper, R.F.</creatorcontrib><creatorcontrib>Shohet, J.L.</creatorcontrib><creatorcontrib>Shenai, K.</creatorcontrib><creatorcontrib>Dallman, D.</creatorcontrib><creatorcontrib>Goeckner, M.J.</creatorcontrib><creatorcontrib>Breun, R.</creatorcontrib><creatorcontrib>Hitchon, W.N.G.</creatorcontrib><creatorcontrib>Wickesberg, E.</creatorcontrib><creatorcontrib>Speth, R.</creatorcontrib><creatorcontrib>Jacobs, J.R.</creatorcontrib><creatorcontrib>Was, G.</creatorcontrib><title>Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation</title><title>Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)</title><addtitle>PLASMA</addtitle><subject>Ceramics</subject><subject>CMOS technology</subject><subject>DNA</subject><subject>Electron beams</subject><subject>Flue gases</subject><subject>Glass</subject><subject>Ion implantation</subject><subject>Plasma sources</subject><subject>Silicon</subject><subject>Surface treatment</subject><issn>0730-9244</issn><issn>2576-7208</issn><isbn>0780320069</isbn><isbn>9780780320062</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1994</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotkMluwjAYhK0uUlPKC3DyC4T-XuLlmKJCkVIVCSr1hhzbqVwlAdnhwNs3lM5lpE8zcxiEZgTmhIB-3lTl9r2cE635vFBKq-IGZbSQIpcU1C16BKmAUQCh71AGkkGuKecPaJrSD4ziBQHKM_T1corBO7zw0XTB4sqcfcTLQ-zMEA49Xvd41ZqUcNk7vA1tsCP8TKH_xpuRdwZvD6doPV5fwt2xNf3w13xC941pk5_--wTtlq-7xVtefazWi7LKg5JDzhR1hDa0NrUGJ4UDKVVthTK2YQ6sY9Jo0QhugAtoqPTSFcRTLwkoZS2boNl1Nnjv98cYOhPP--sl7Be56lNg</recordid><startdate>1994</startdate><enddate>1994</enddate><creator>Booske, J.H.</creator><creator>Zhan, L.</creator><creator>Cooper, R.F.</creator><creator>Shohet, J.L.</creator><creator>Shenai, K.</creator><creator>Dallman, D.</creator><creator>Goeckner, M.J.</creator><creator>Breun, R.</creator><creator>Hitchon, W.N.G.</creator><creator>Wickesberg, E.</creator><creator>Speth, R.</creator><creator>Jacobs, J.R.</creator><creator>Was, G.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>1994</creationdate><title>Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation</title><author>Booske, J.H. ; 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| identifier | ISSN: 0730-9244 |
| ispartof | Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS), 1994, p.166-166 |
| issn | 0730-9244 2576-7208 |
| language | eng |
| recordid | cdi_ieee_primary_588985 |
| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Ceramics CMOS technology DNA Electron beams Flue gases Glass Ion implantation Plasma sources Silicon Surface treatment |
| title | Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation |
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