Negative bias temperature instability "multi-mode" compact model based on threshold voltage and mobility degradation
In this paper we have developed a model to obtain drain current (ID) degradation at all transistor operating modes (linear, saturation and sub-threshold) during NBTI stress based on threshold voltage (VT) and mobility (μ) degradation. This model provides a compact way to comprehend NBTI induced drai...
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Format: | Tagungsbericht |
Sprache: | eng |
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Zusammenfassung: | In this paper we have developed a model to obtain drain current (ID) degradation at all transistor operating modes (linear, saturation and sub-threshold) during NBTI stress based on threshold voltage (VT) and mobility (μ) degradation. This model provides a compact way to comprehend NBTI induced drain current degradation for transistors subject to multiple operating modes (e.g., dynamic voltage scaling, active/standby modes). |
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ISSN: | 1541-7026 1938-1891 |
DOI: | 10.1109/IRPS.2011.5784451 |