Negative bias temperature instability "multi-mode" compact model based on threshold voltage and mobility degradation

In this paper we have developed a model to obtain drain current (ID) degradation at all transistor operating modes (linear, saturation and sub-threshold) during NBTI stress based on threshold voltage (VT) and mobility (μ) degradation. This model provides a compact way to comprehend NBTI induced drai...

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Hauptverfasser: Varghese, D, Higgins, R, Dunn, S, Krishnan, A T, Reddy, V, Krishnan, S
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:In this paper we have developed a model to obtain drain current (ID) degradation at all transistor operating modes (linear, saturation and sub-threshold) during NBTI stress based on threshold voltage (VT) and mobility (μ) degradation. This model provides a compact way to comprehend NBTI induced drain current degradation for transistors subject to multiple operating modes (e.g., dynamic voltage scaling, active/standby modes).
ISSN:1541-7026
1938-1891
DOI:10.1109/IRPS.2011.5784451