Emitter diffusion method for extremely thin silicon wafers

The aim of this study is to optimize a low cost phosphorus diffusion process suitable for pn junction formation on extremely thin (

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Hauptverfasser: Ochoa-Martínez, E, Merchán, D, Romero, R, Gabás, M, Martínez, L, Martín, F, Leinen, D, Ramos-Barrado, J R, Vázquez, C, Hartiti, B
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creator Ochoa-Martínez, E
Merchán, D
Romero, R
Gabás, M
Martínez, L
Martín, F
Leinen, D
Ramos-Barrado, J R
Vázquez, C
Hartiti, B
description The aim of this study is to optimize a low cost phosphorus diffusion process suitable for pn junction formation on extremely thin (
doi_str_mv 10.1109/SCED.2011.5744189
format Conference Proceeding
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identifier ISSN: 2163-4971
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2643-1300
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects c-Si
gettering
phosphorus diffussion
Photovoltaic cells
Photovoltaic systems
Resistance
Silicon
solar cells
Solar energy
spray coating
Temperature measurement
title Emitter diffusion method for extremely thin silicon wafers
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