Emitter diffusion method for extremely thin silicon wafers

Emitter diffusion method for extremely thin silicon wafers

The aim of this study is to optimize a low cost phosphorus diffusion process suitable for pn junction formation on extremely thin (

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Ochoa-Martínez, E, Merchán, D, Romero, R, Gabás, M, Martínez, L, Martín, F, Leinen, D, Ramos-Barrado, J R, Vázquez, C, Hartiti, B
Format: Tagungsbericht
Sprache:eng
Schlagworte:
c-Si
gettering
phosphorus diffussion
Photovoltaic cells
Photovoltaic systems
Resistance
Silicon
solar cells
Solar energy
spray coating
Temperature measurement
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The aim of this study is to optimize a low cost phosphorus diffusion process suitable for pn junction formation on extremely thin (
ISSN:2163-4971
2643-1300
DOI:10.1109/SCED.2011.5744189