ECR plasma-assisted deposition of Pb phthalocyanine thin films
The effect of Ar low-temperature electron cyclotron resonance plasma on a growth of lead phthalocyanine films has been investigated by means of RHEED, AFM and IR spectroscopy. It has been found that at low intensity of the plasma assisting the films are subjected to a structural transformation that...
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creator | Aliev, Vladimir Sh Badmaeva, Irena A |
description | The effect of Ar low-temperature electron cyclotron resonance plasma on a growth of lead phthalocyanine films has been investigated by means of RHEED, AFM and IR spectroscopy. It has been found that at low intensity of the plasma assisting the films are subjected to a structural transformation that are similar a vacuum annealing. As the intensity of the assisting is increased, the growth of polymer matrix and an increase in shares of crystalline phase in the films have been observed. |
doi_str_mv | 10.1109/EDM.2010.5568682 |
format | Conference Proceeding |
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It has been found that at low intensity of the plasma assisting the films are subjected to a structural transformation that are similar a vacuum annealing. As the intensity of the assisting is increased, the growth of polymer matrix and an increase in shares of crystalline phase in the films have been observed.</description><identifier>ISSN: 1815-3712</identifier><identifier>ISBN: 9781424466269</identifier><identifier>ISBN: 1424466261</identifier><identifier>EISBN: 9781424466283</identifier><identifier>EISBN: 1424466288</identifier><identifier>EISBN: 9781424466276</identifier><identifier>EISBN: 142446627X</identifier><identifier>DOI: 10.1109/EDM.2010.5568682</identifier><language>eng</language><publisher>IEEE</publisher><subject>Atmospheric measurements ; Atomic measurements ; ECR ; Heating ; metal phthalocyanines ; Organic semiconductors ; Particle measurements ; Voltage measurement</subject><ispartof>2010 11th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, 2010, p.21-24</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/5568682$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,27902,54895</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/5568682$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Aliev, Vladimir Sh</creatorcontrib><creatorcontrib>Badmaeva, Irena A</creatorcontrib><title>ECR plasma-assisted deposition of Pb phthalocyanine thin films</title><title>2010 11th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices</title><addtitle>EDM</addtitle><description>The effect of Ar low-temperature electron cyclotron resonance plasma on a growth of lead phthalocyanine films has been investigated by means of RHEED, AFM and IR spectroscopy. It has been found that at low intensity of the plasma assisting the films are subjected to a structural transformation that are similar a vacuum annealing. As the intensity of the assisting is increased, the growth of polymer matrix and an increase in shares of crystalline phase in the films have been observed.</description><subject>Atmospheric measurements</subject><subject>Atomic measurements</subject><subject>ECR</subject><subject>Heating</subject><subject>metal phthalocyanines</subject><subject>Organic semiconductors</subject><subject>Particle measurements</subject><subject>Voltage measurement</subject><issn>1815-3712</issn><isbn>9781424466269</isbn><isbn>1424466261</isbn><isbn>9781424466283</isbn><isbn>1424466288</isbn><isbn>9781424466276</isbn><isbn>142446627X</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2010</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNpVkMtqwzAURFXaQkPqfaEb_YBTXV1ZljaF4roPSEko2QfZusYqfhF5k7-vodl0NsNhhlkMYw8gNgDCPpWvXxspFsoybbSRVyyxuQElldJaGrz-x9resBUYyFLMQd6xJMYfIQTCUsF8xZ7L4ptPnYu9S12MIc7kuadpjGEO48DHhu8rPrVz67qxPrshDMTnNgy8CV0f79lt47pIycXX7PBWHoqPdLt7_yxetmmwYk4tZigBlSKw6PQiWVvllVbocld70I1UjRHaLzlVvqpQKCTM8opq5QHX7PFvNhDRcTqF3p3Ox8sB-AvffErr</recordid><startdate>201006</startdate><enddate>201006</enddate><creator>Aliev, Vladimir Sh</creator><creator>Badmaeva, Irena A</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>201006</creationdate><title>ECR plasma-assisted deposition of Pb phthalocyanine thin films</title><author>Aliev, Vladimir Sh ; Badmaeva, Irena A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i90t-935321344e193a66662c94d4643a7acd16f24f806d193ebdbb3043e357bec4d13</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Atmospheric measurements</topic><topic>Atomic measurements</topic><topic>ECR</topic><topic>Heating</topic><topic>metal phthalocyanines</topic><topic>Organic semiconductors</topic><topic>Particle measurements</topic><topic>Voltage measurement</topic><toplevel>online_resources</toplevel><creatorcontrib>Aliev, Vladimir Sh</creatorcontrib><creatorcontrib>Badmaeva, Irena A</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Aliev, Vladimir Sh</au><au>Badmaeva, Irena A</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>ECR plasma-assisted deposition of Pb phthalocyanine thin films</atitle><btitle>2010 11th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices</btitle><stitle>EDM</stitle><date>2010-06</date><risdate>2010</risdate><spage>21</spage><epage>24</epage><pages>21-24</pages><issn>1815-3712</issn><isbn>9781424466269</isbn><isbn>1424466261</isbn><eisbn>9781424466283</eisbn><eisbn>1424466288</eisbn><eisbn>9781424466276</eisbn><eisbn>142446627X</eisbn><abstract>The effect of Ar low-temperature electron cyclotron resonance plasma on a growth of lead phthalocyanine films has been investigated by means of RHEED, AFM and IR spectroscopy. It has been found that at low intensity of the plasma assisting the films are subjected to a structural transformation that are similar a vacuum annealing. As the intensity of the assisting is increased, the growth of polymer matrix and an increase in shares of crystalline phase in the films have been observed.</abstract><pub>IEEE</pub><doi>10.1109/EDM.2010.5568682</doi><tpages>4</tpages></addata></record> |
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ispartof | 2010 11th International Conference and Seminar on Micro/Nanotechnologies and Electron Devices, 2010, p.21-24 |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Atmospheric measurements Atomic measurements ECR Heating metal phthalocyanines Organic semiconductors Particle measurements Voltage measurement |
title | ECR plasma-assisted deposition of Pb phthalocyanine thin films |
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