ECR plasma-assisted deposition of Pb phthalocyanine thin films

ECR plasma-assisted deposition of Pb phthalocyanine thin films

The effect of Ar low-temperature electron cyclotron resonance plasma on a growth of lead phthalocyanine films has been investigated by means of RHEED, AFM and IR spectroscopy. It has been found that at low intensity of the plasma assisting the films are subjected to a structural transformation that...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Aliev, Vladimir Sh, Badmaeva, Irena A
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Atmospheric measurements
Atomic measurements
ECR
Heating
metal phthalocyanines
Organic semiconductors
Particle measurements
Voltage measurement
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Beschreibung
Zusammenfassung:The effect of Ar low-temperature electron cyclotron resonance plasma on a growth of lead phthalocyanine films has been investigated by means of RHEED, AFM and IR spectroscopy. It has been found that at low intensity of the plasma assisting the films are subjected to a structural transformation that are similar a vacuum annealing. As the intensity of the assisting is increased, the growth of polymer matrix and an increase in shares of crystalline phase in the films have been observed.
ISSN:1815-3712
DOI:10.1109/EDM.2010.5568682