Process variation compensation of a 4.6 GHz LNA in 65nm CMOS
We present the design of a 4.6 GHz LNA in TSMC 65nm with a feedback scheme to compensate for variations across process, supply voltage, and temperature. No post fabrication efforts are required in this compensation method. The proposed method improves the variation in S 21 of an inductively degenera...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Tagungsbericht |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | We present the design of a 4.6 GHz LNA in TSMC 65nm with a feedback scheme to compensate for variations across process, supply voltage, and temperature. No post fabrication efforts are required in this compensation method. The proposed method improves the variation in S 21 of an inductively degenerated cascode LNA from 8.75% to 1.27%, which is a reduction in variation of 85%. The presented scheme is also robust over variations in supply voltage, temperature, and process conditions. The compensation method presented can be utilized to stabilize the gain of a wide variety of amplifiers. |
---|---|
ISSN: | 0271-4302 2158-1525 |
DOI: | 10.1109/ISCAS.2010.5537131 |