A two-dimensional micromachined accelerometer
A surface micromachined two-dimensional (2-D) accelerometer is designed and implemented in CMOS. The implementation requires the addition of three masking steps to a commercially available standard CMOS process. It has a /spl plusmn/100 g full range reading and better than 1% linearity within this r...
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Veröffentlicht in: | IEEE transactions on instrumentation and measurement 1997-02, Vol.46 (1), p.18-26 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A surface micromachined two-dimensional (2-D) accelerometer is designed and implemented in CMOS. The implementation requires the addition of three masking steps to a commercially available standard CMOS process. It has a /spl plusmn/100 g full range reading and better than 1% linearity within this range with a sensitivity of 0.5 mV/g. The signal detection circuitry is an on-chip switched capacitor charge transfer circuit operating on an internally generated 1 MHz four-phase nonoverlapping clock. The design takes into account the electrostatic forces, the damping force, and the applied force due to acceleration. |
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ISSN: | 0018-9456 1557-9662 |
DOI: | 10.1109/19.552151 |