9.3: Fabrication of solid copper 220 GHz folded waveguide circuits by UV lithography

9.3: Fabrication of solid copper 220 GHz folded waveguide circuits by UV lithography

We report the fabrication results for an all-copper 220 GHz folded waveguide circuit. The fabrication method is based on UV lithography using SU-8 negative photoresist followed by copper electroforming. The method achieved the necessary dimensional accuracy, smooth vertical side walls, low cost of f...

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Hauptverfasser: Makarova, Olga V, Divan, Ralu, Tucek, John, Kreischer, Kenneth, Amstutz, Platte T, Mancini, Derrick C, Cha-Mei Tang
Format: Tagungsbericht
Sprache:eng
Schlagworte:
220 GHz waveguide
Circuits
Copper
Electron beams
Etching
folded waveguide circuit
Geometry
Gratings
HiFIVE
LIGA
Lithography
Optical device fabrication
Solids
SU-8
Thermal conductivity
UV lithography
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Zusammenfassung:We report the fabrication results for an all-copper 220 GHz folded waveguide circuit. The fabrication method is based on UV lithography using SU-8 negative photoresist followed by copper electroforming. The method achieved the necessary dimensional accuracy, smooth vertical side walls, low cost of fabrication, and all-copper structure suitable for high power applications.
DOI:10.1109/IVELEC.2010.5503541