High resolution 3-D laser direct-write patterning

Resolution Augmentation through Photo-Induced Deactivation (RAPID) lithography makes possible the creation of features that far smaller than the wavelength of light employed. We will present some of the latest advances in RAPID lithography.

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Bibliographische Detailangaben
Hauptverfasser:	Linjie Li, Gattass, Rafael R, Stocker, Michael, Gershgoren, Erez, Hwang, Hana, Fourkas, John T
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	(160.5470) Polymers (190.4180) Multiphoton processes Absorption Biomedical optical imaging Chemical lasers Educational institutions Laser beams Lithography Microscopy Optical polymers Resists Ultrafast optics
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Beschreibung
Zusammenfassung:	Resolution Augmentation through Photo-Induced Deactivation (RAPID) lithography makes possible the creation of features that far smaller than the wavelength of light employed. We will present some of the latest advances in RAPID lithography.
DOI:	10.1364/cleo.2010.jtua1