A 32nm High-k metal gate SRAM with adaptive dynamic stability enhancement for low-voltage operation
A 3.4 Mb SRAM macro is developed with a built-in stability sensor for adaptive wordline under-drive (AWLUD) in 32 nm HK-MG CMOS technology. By tracking temperature, voltage and process variation of each die, the AWLUD is shown to lower VCCmin by 130 mV, increase yield by 9% at a target frequency, an...
Gespeichert in:
Hauptverfasser: | , , , , , , , |
---|---|
Format: | Tagungsbericht |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 347 |
---|---|
container_issue | |
container_start_page | 346 |
container_title | |
container_volume | |
creator | Hyunwoo Nho Kolar, P. Hamzaoglu, F. Yih Wang Karl, E. Yong-Gee Ng Bhattacharya, U. Zhang, K. |
description | A 3.4 Mb SRAM macro is developed with a built-in stability sensor for adaptive wordline under-drive (AWLUD) in 32 nm HK-MG CMOS technology. By tracking temperature, voltage and process variation of each die, the AWLUD is shown to lower VCCmin by 130 mV, increase yield by 9% at a target frequency, and is projected to reduce test time up to 40% by eliminating die-by-die WLUD programming. |
doi_str_mv | 10.1109/ISSCC.2010.5433816 |
format | Conference Proceeding |
fullrecord | <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_5433816</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>5433816</ieee_id><sourcerecordid>5433816</sourcerecordid><originalsourceid>FETCH-ieee_primary_54338163</originalsourceid><addsrcrecordid>eNp9j7tOwzAUQM2jEin0B2C5P-ByHTuuM1YRVRlYCHt1SW8TQ-JEidWqfw9DWZmOjs50hHhUuFQK8-fXsiyKZYq_nhmtnbJXYpGvnDKpMRZ1ll-LJNUrK51FeyPmf0HbW5GgyrW0mcaZSJyS1hin8E7Mp-kLEbPcukRUa9Bp6GDr60Z-Q8eRWqgpMpTv6zc4-dgA7WmI_siwPwfqfAVTpE_f-ngGDg2FijsOEQ79CG1_kse-jVQz9AOPFH0fHsTsQO3EiwvvxdPm5aPYSs_Mu2H0HY3n3WVQ_19_AMxYTNQ</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>A 32nm High-k metal gate SRAM with adaptive dynamic stability enhancement for low-voltage operation</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Hyunwoo Nho ; Kolar, P. ; Hamzaoglu, F. ; Yih Wang ; Karl, E. ; Yong-Gee Ng ; Bhattacharya, U. ; Zhang, K.</creator><creatorcontrib>Hyunwoo Nho ; Kolar, P. ; Hamzaoglu, F. ; Yih Wang ; Karl, E. ; Yong-Gee Ng ; Bhattacharya, U. ; Zhang, K.</creatorcontrib><description>A 3.4 Mb SRAM macro is developed with a built-in stability sensor for adaptive wordline under-drive (AWLUD) in 32 nm HK-MG CMOS technology. By tracking temperature, voltage and process variation of each die, the AWLUD is shown to lower VCCmin by 130 mV, increase yield by 9% at a target frequency, and is projected to reduce test time up to 40% by eliminating die-by-die WLUD programming.</description><identifier>ISSN: 0193-6530</identifier><identifier>ISBN: 1424460336</identifier><identifier>ISBN: 9781424460335</identifier><identifier>EISSN: 2376-8606</identifier><identifier>EISBN: 9781424460359</identifier><identifier>EISBN: 1424460352</identifier><identifier>EISBN: 9781424460366</identifier><identifier>EISBN: 1424460360</identifier><identifier>DOI: 10.1109/ISSCC.2010.5433816</identifier><identifier>LCCN: 81-644810</identifier><language>eng</language><publisher>IEEE</publisher><subject>Circuits ; CMOS technology ; Degradation ; Frequency ; Random access memory ; Sensor arrays ; Stability ; Temperature sensors ; Testing ; Voltage</subject><ispartof>2010 IEEE International Solid-State Circuits Conference - (ISSCC), 2010, p.346-347</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/5433816$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,27902,54895</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/5433816$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Hyunwoo Nho</creatorcontrib><creatorcontrib>Kolar, P.</creatorcontrib><creatorcontrib>Hamzaoglu, F.</creatorcontrib><creatorcontrib>Yih Wang</creatorcontrib><creatorcontrib>Karl, E.</creatorcontrib><creatorcontrib>Yong-Gee Ng</creatorcontrib><creatorcontrib>Bhattacharya, U.</creatorcontrib><creatorcontrib>Zhang, K.</creatorcontrib><title>A 32nm High-k metal gate SRAM with adaptive dynamic stability enhancement for low-voltage operation</title><title>2010 IEEE International Solid-State Circuits Conference - (ISSCC)</title><addtitle>ISSCC</addtitle><description>A 3.4 Mb SRAM macro is developed with a built-in stability sensor for adaptive wordline under-drive (AWLUD) in 32 nm HK-MG CMOS technology. By tracking temperature, voltage and process variation of each die, the AWLUD is shown to lower VCCmin by 130 mV, increase yield by 9% at a target frequency, and is projected to reduce test time up to 40% by eliminating die-by-die WLUD programming.</description><subject>Circuits</subject><subject>CMOS technology</subject><subject>Degradation</subject><subject>Frequency</subject><subject>Random access memory</subject><subject>Sensor arrays</subject><subject>Stability</subject><subject>Temperature sensors</subject><subject>Testing</subject><subject>Voltage</subject><issn>0193-6530</issn><issn>2376-8606</issn><isbn>1424460336</isbn><isbn>9781424460335</isbn><isbn>9781424460359</isbn><isbn>1424460352</isbn><isbn>9781424460366</isbn><isbn>1424460360</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2010</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9j7tOwzAUQM2jEin0B2C5P-ByHTuuM1YRVRlYCHt1SW8TQ-JEidWqfw9DWZmOjs50hHhUuFQK8-fXsiyKZYq_nhmtnbJXYpGvnDKpMRZ1ll-LJNUrK51FeyPmf0HbW5GgyrW0mcaZSJyS1hin8E7Mp-kLEbPcukRUa9Bp6GDr60Z-Q8eRWqgpMpTv6zc4-dgA7WmI_siwPwfqfAVTpE_f-ngGDg2FijsOEQ79CG1_kse-jVQz9AOPFH0fHsTsQO3EiwvvxdPm5aPYSs_Mu2H0HY3n3WVQ_19_AMxYTNQ</recordid><startdate>201002</startdate><enddate>201002</enddate><creator>Hyunwoo Nho</creator><creator>Kolar, P.</creator><creator>Hamzaoglu, F.</creator><creator>Yih Wang</creator><creator>Karl, E.</creator><creator>Yong-Gee Ng</creator><creator>Bhattacharya, U.</creator><creator>Zhang, K.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>201002</creationdate><title>A 32nm High-k metal gate SRAM with adaptive dynamic stability enhancement for low-voltage operation</title><author>Hyunwoo Nho ; Kolar, P. ; Hamzaoglu, F. ; Yih Wang ; Karl, E. ; Yong-Gee Ng ; Bhattacharya, U. ; Zhang, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_54338163</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Circuits</topic><topic>CMOS technology</topic><topic>Degradation</topic><topic>Frequency</topic><topic>Random access memory</topic><topic>Sensor arrays</topic><topic>Stability</topic><topic>Temperature sensors</topic><topic>Testing</topic><topic>Voltage</topic><toplevel>online_resources</toplevel><creatorcontrib>Hyunwoo Nho</creatorcontrib><creatorcontrib>Kolar, P.</creatorcontrib><creatorcontrib>Hamzaoglu, F.</creatorcontrib><creatorcontrib>Yih Wang</creatorcontrib><creatorcontrib>Karl, E.</creatorcontrib><creatorcontrib>Yong-Gee Ng</creatorcontrib><creatorcontrib>Bhattacharya, U.</creatorcontrib><creatorcontrib>Zhang, K.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Hyunwoo Nho</au><au>Kolar, P.</au><au>Hamzaoglu, F.</au><au>Yih Wang</au><au>Karl, E.</au><au>Yong-Gee Ng</au><au>Bhattacharya, U.</au><au>Zhang, K.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>A 32nm High-k metal gate SRAM with adaptive dynamic stability enhancement for low-voltage operation</atitle><btitle>2010 IEEE International Solid-State Circuits Conference - (ISSCC)</btitle><stitle>ISSCC</stitle><date>2010-02</date><risdate>2010</risdate><spage>346</spage><epage>347</epage><pages>346-347</pages><issn>0193-6530</issn><eissn>2376-8606</eissn><isbn>1424460336</isbn><isbn>9781424460335</isbn><eisbn>9781424460359</eisbn><eisbn>1424460352</eisbn><eisbn>9781424460366</eisbn><eisbn>1424460360</eisbn><abstract>A 3.4 Mb SRAM macro is developed with a built-in stability sensor for adaptive wordline under-drive (AWLUD) in 32 nm HK-MG CMOS technology. By tracking temperature, voltage and process variation of each die, the AWLUD is shown to lower VCCmin by 130 mV, increase yield by 9% at a target frequency, and is projected to reduce test time up to 40% by eliminating die-by-die WLUD programming.</abstract><pub>IEEE</pub><doi>10.1109/ISSCC.2010.5433816</doi></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | ISSN: 0193-6530 |
ispartof | 2010 IEEE International Solid-State Circuits Conference - (ISSCC), 2010, p.346-347 |
issn | 0193-6530 2376-8606 |
language | eng |
recordid | cdi_ieee_primary_5433816 |
source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Circuits CMOS technology Degradation Frequency Random access memory Sensor arrays Stability Temperature sensors Testing Voltage |
title | A 32nm High-k metal gate SRAM with adaptive dynamic stability enhancement for low-voltage operation |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T07%3A46%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=A%2032nm%20High-k%20metal%20gate%20SRAM%20with%20adaptive%20dynamic%20stability%20enhancement%20for%20low-voltage%20operation&rft.btitle=2010%20IEEE%20International%20Solid-State%20Circuits%20Conference%20-%20(ISSCC)&rft.au=Hyunwoo%20Nho&rft.date=2010-02&rft.spage=346&rft.epage=347&rft.pages=346-347&rft.issn=0193-6530&rft.eissn=2376-8606&rft.isbn=1424460336&rft.isbn_list=9781424460335&rft_id=info:doi/10.1109/ISSCC.2010.5433816&rft_dat=%3Cieee_6IE%3E5433816%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&rft.eisbn=9781424460359&rft.eisbn_list=1424460352&rft.eisbn_list=9781424460366&rft.eisbn_list=1424460360&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=5433816&rfr_iscdi=true |