Deposition of diamond-like carbon (DLC) films using hydrocarbon plasmas

Summary form only given, as follows. The structure-property relationships of two differently processed hydrogenated amorphous carbon thin films (a-C:H) and their application as protective overcoats for thin film magnetic media have been studied. The films were deposited by a reactive sputtering syst...

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Bibliographische Detailangaben
Hauptverfasser: Muller, D.E., Conrad, J.R.
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:Summary form only given, as follows. The structure-property relationships of two differently processed hydrogenated amorphous carbon thin films (a-C:H) and their application as protective overcoats for thin film magnetic media have been studied. The films were deposited by a reactive sputtering system and the plasma source ion implantation (PSII) techniques. Rutherford backscattering spectrometry (RES) and forward recoil energy spectrometry (FRES) results showed all film compositions to be in the following carbon, hydrogen and oxygen atomic percent ranges 40
ISSN:0730-9244
2576-7208
DOI:10.1109/PLASMA.1995.533486