Silicon-on-Glass (SiOG) substrate technology: Process and materials properties

This paper is an introduction to a new silicon-on-glass substrate technology. The fabrication process and material properties of SiOG are presented. The semiconductor film has good electrical properties, comparable to other SOI technologies, and is strongly attached to a large area transparent subst...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Cites, J.S., Couillard, J.G., Gadkaree, K.P.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Amorphous silicon Bonding Flat panel displays Glass Grain boundaries Material properties Plasma temperature Semiconductor films Silicon on insulator technology Substrates
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