Silicon-on-Glass (SiOG) substrate technology: Process and materials properties

Silicon-on-Glass (SiOG) substrate technology: Process and materials properties

This paper is an introduction to a new silicon-on-glass substrate technology. The fabrication process and material properties of SiOG are presented. The semiconductor film has good electrical properties, comparable to other SOI technologies, and is strongly attached to a large area transparent subst...

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Bibliographische Detailangaben
Hauptverfasser: Cites, J.S., Couillard, J.G., Gadkaree, K.P.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Amorphous silicon
Bonding
Flat panel displays
Glass
Grain boundaries
Material properties
Plasma temperature
Semiconductor films
Silicon on insulator technology
Substrates
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Beschreibung
Zusammenfassung:This paper is an introduction to a new silicon-on-glass substrate technology. The fabrication process and material properties of SiOG are presented. The semiconductor film has good electrical properties, comparable to other SOI technologies, and is strongly attached to a large area transparent substrate via an in-situ barrier layer compatible with FPD processing.
ISSN:1078-621X
2577-2295
DOI:10.1109/SOI.2009.5318764