Special Section on the International Symposium on Semiconductor Manufacturing

The ten papers in this special section were originally presented at the International Symposium on Semiconductor Manufacturing, held October 27-29, 2008, in Tokyo, Japan.

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Bibliographische Detailangaben
Veröffentlicht in:	IEEE transactions on semiconductor manufacturing 2009-11, Vol.22 (4), p.417-418
Hauptverfasser:	Otsuka, Nobuhiro, Uchino, Toshiyuki
Format:	Artikel
Sprache:	eng
Schlagworte:	Copper Etching Lithography Metrology Plasma applications Process control Rapid thermal annealing Semiconductor device manufacture Semiconductor process modeling Special issues and sections
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Beschreibung
Zusammenfassung:	The ten papers in this special section were originally presented at the International Symposium on Semiconductor Manufacturing, held October 27-29, 2008, in Tokyo, Japan.
ISSN:	0894-6507 1558-2345
DOI:	10.1109/TSM.2009.2031745