Achieving resolution far beyond the diffraction limit with RAPID photolithography

Achieving resolution far beyond the diffraction limit with RAPID photolithography

A method to scale the resolution in photolithographic fabrication is introduced, in which one laser beam is used to initiate multiphoton absorption polymerization in a negative-tone photoresist while a second, phase-shaped laser beam is used to deactivate the polymerization. This approach allows for...

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Bibliographische Detailangaben
Hauptverfasser: Linjie Li, Gattass, R.R., Gershgoren, E., Fourkas, J.T.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
(110.4235) Nanolithography
(110.5220) Photolithography
(110.6895) Three-dimensional lithography
(120.4610) Optical fabrication
(220.4241) Nanostructure fabrication
Absorption
Diffraction
Educational institutions
Laser beams
Laser modes
Lithography
Optical device fabrication
Optical polymers
Resists
Spatial resolution
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Beschreibung
Zusammenfassung:A method to scale the resolution in photolithographic fabrication is introduced, in which one laser beam is used to initiate multiphoton absorption polymerization in a negative-tone photoresist while a second, phase-shaped laser beam is used to deactivate the polymerization. This approach allows for fabrication of polymeric nanostructures with lambda/20 resolution.
ISSN:2160-9004