Low loss etchless silicon photonic waveguides

We demonstrate low loss silicon waveguides fabricated without silicon etching by selective oxidation. We show propagation losses of 0.3dB/cm (lambda=1.55 mum), roughness of 0.3 nm RMS, and 0.0002 dB loss for a 90deg bend with 20 mum bending radius.

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Bibliographische Detailangaben
Hauptverfasser:	Cardenas, J., Poitras, C.B., Robinson, J.T., Preston, K., Long Chen, Lipson, M.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	(230.7370) Waveguides (250.5300) Photonic integrated circuits Etching Optical losses Optical waveguides Oxidation Plasma applications Plasma chemistry Propagation losses Silicon Slabs Tellurium
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Beschreibung
Zusammenfassung:	We demonstrate low loss silicon waveguides fabricated without silicon etching by selective oxidation. We show propagation losses of 0.3dB/cm (lambda=1.55 mum), roughness of 0.3 nm RMS, and 0.0002 dB loss for a 90deg bend with 20 mum bending radius.
ISSN:	2160-9004
DOI:	10.1364/CLEO.2009.CThU6