Frequency and recovery effects in high-κ BTI degradation

Net end-of-life aging prediction under realistic use conditions is the key objective for any product aging model. In this paper, a net degradation model is introduced and effects such as recovery, subsequent degradation, frequency, duty cycle, and recovery bias are evaluated. The high-kappa recovery...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Ramey, S., Prasad, C., Agostinelli, M., Sangwoo Pae, Walstra, S., Gupta, S., Hicks, J.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Net end-of-life aging prediction under realistic use conditions is the key objective for any product aging model. In this paper, a net degradation model is introduced and effects such as recovery, subsequent degradation, frequency, duty cycle, and recovery bias are evaluated. The high-kappa recovery behavior observed is consistent with SiO 2 gate stacks, which allows the use of SiO 2 models to predict recovery in both NMOS and PMOS high-kappa transistors.
ISSN:1541-7026
1938-1891
DOI:10.1109/IRPS.2009.5173404