Advanced heterogeneous integration of InP HBT and CMOS Si technologies for high performance mixed signal applications

Northrop Grumman Space Technology (NGST) is developing an advanced heterogeneous integration (AHI) process to integrate III-V semiconductor chiplets on CMOS wafers under the compound semiconductor materials on silicon (COSMOS) DARPA program. The objective of the program is to have a heterogeneous in...

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Hauptverfasser: Gutierrez-Aitken, A., Chang-Chien, P., Wen Phan, Scott, D., Oyama, B., Sandhu, R., Zhou, J., Nam, P., Hennig, K., Parlee, M., Poust, B., Khanh Thai, Geiger, C., Oki, A., Kagiwada, R.
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creator Gutierrez-Aitken, A.
Chang-Chien, P.
Wen Phan
Scott, D.
Oyama, B.
Sandhu, R.
Zhou, J.
Nam, P.
Hennig, K.
Parlee, M.
Poust, B.
Khanh Thai
Geiger, C.
Oki, A.
Kagiwada, R.
description Northrop Grumman Space Technology (NGST) is developing an advanced heterogeneous integration (AHI) process to integrate III-V semiconductor chiplets on CMOS wafers under the compound semiconductor materials on silicon (COSMOS) DARPA program. The objective of the program is to have a heterogeneous interconnect pitch and length less than 5 um to enable intimate transistor scale integration. This integration will enable significant improvement in ADC dynamic range and bandwidth.
doi_str_mv 10.1109/MWSYM.2009.5165895
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fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_5165895</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>5165895</ieee_id><sourcerecordid>5165895</sourcerecordid><originalsourceid>FETCH-LOGICAL-i175t-4d133b49e4628c7d52262b0f183a64dac67cf9ee6bbcdcd8c75be37ebe3472313</originalsourceid><addsrcrecordid>eNpFkM1OwkAcxNevREBfQC_7AsX9bntEgkICwQSMeiLb3X_bNWXbdIvRt7cqiZeZSWbyOwxCN5SMKSXp3epl87YaM0LSsaRKJqk8QUMqmBAsIYKeogGTsYpiRtXZf8H5ORoQKtJICfl6iYYhvBNCZELVAB0m9kN7AxaX0EFbF-ChPgTsfAdFqztXe1zneOGf8Px-i7W3eLpab_DG4Q5M6euqLhwEnNctLl1R4gbaPu9_mHjvPntwcIXXFdZNUznzSwxX6CLXVYDro4_Q88NsO51Hy_XjYjpZRo7GsouEpZxnIgWhWGJiKxlTLCM5TbhWwmqjYpOnACrLjDW2n8gMeAy9iJhxykfo9o_rAGDXtG6v26_d8Tv-DbBSYSc</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Advanced heterogeneous integration of InP HBT and CMOS Si technologies for high performance mixed signal applications</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Gutierrez-Aitken, A. ; Chang-Chien, P. ; Wen Phan ; Scott, D. ; Oyama, B. ; Sandhu, R. ; Zhou, J. ; Nam, P. ; Hennig, K. ; Parlee, M. ; Poust, B. ; Khanh Thai ; Geiger, C. ; Oki, A. ; Kagiwada, R.</creator><creatorcontrib>Gutierrez-Aitken, A. ; Chang-Chien, P. ; Wen Phan ; Scott, D. ; Oyama, B. ; Sandhu, R. ; Zhou, J. ; Nam, P. ; Hennig, K. ; Parlee, M. ; Poust, B. ; Khanh Thai ; Geiger, C. ; Oki, A. ; Kagiwada, R.</creatorcontrib><description>Northrop Grumman Space Technology (NGST) is developing an advanced heterogeneous integration (AHI) process to integrate III-V semiconductor chiplets on CMOS wafers under the compound semiconductor materials on silicon (COSMOS) DARPA program. The objective of the program is to have a heterogeneous interconnect pitch and length less than 5 um to enable intimate transistor scale integration. This integration will enable significant improvement in ADC dynamic range and bandwidth.</description><identifier>ISSN: 0149-645X</identifier><identifier>ISBN: 1424428033</identifier><identifier>ISBN: 9781424428038</identifier><identifier>EISSN: 2576-7216</identifier><identifier>EISBN: 1424428041</identifier><identifier>EISBN: 9781424428045</identifier><identifier>DOI: 10.1109/MWSYM.2009.5165895</identifier><language>eng</language><publisher>IEEE</publisher><subject>Analog-digital conversion ; Bandwidth ; CMOS process ; CMOS technology ; CMOSFETs ; Dynamic range ; Heterogeneous Integration ; Heterojunction bipolar transistors ; III-V semiconductor materials ; Indium phosphide ; Semiconductor materials ; Silicon ; Space technology</subject><ispartof>2009 IEEE MTT-S International Microwave Symposium Digest, 2009, p.1109-1112</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/5165895$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>310,311,781,785,790,791,2059,27930,54925</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/5165895$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Gutierrez-Aitken, A.</creatorcontrib><creatorcontrib>Chang-Chien, P.</creatorcontrib><creatorcontrib>Wen Phan</creatorcontrib><creatorcontrib>Scott, D.</creatorcontrib><creatorcontrib>Oyama, B.</creatorcontrib><creatorcontrib>Sandhu, R.</creatorcontrib><creatorcontrib>Zhou, J.</creatorcontrib><creatorcontrib>Nam, P.</creatorcontrib><creatorcontrib>Hennig, K.</creatorcontrib><creatorcontrib>Parlee, M.</creatorcontrib><creatorcontrib>Poust, B.</creatorcontrib><creatorcontrib>Khanh Thai</creatorcontrib><creatorcontrib>Geiger, C.</creatorcontrib><creatorcontrib>Oki, A.</creatorcontrib><creatorcontrib>Kagiwada, R.</creatorcontrib><title>Advanced heterogeneous integration of InP HBT and CMOS Si technologies for high performance mixed signal applications</title><title>2009 IEEE MTT-S International Microwave Symposium Digest</title><addtitle>MWSYM</addtitle><description>Northrop Grumman Space Technology (NGST) is developing an advanced heterogeneous integration (AHI) process to integrate III-V semiconductor chiplets on CMOS wafers under the compound semiconductor materials on silicon (COSMOS) DARPA program. The objective of the program is to have a heterogeneous interconnect pitch and length less than 5 um to enable intimate transistor scale integration. This integration will enable significant improvement in ADC dynamic range and bandwidth.</description><subject>Analog-digital conversion</subject><subject>Bandwidth</subject><subject>CMOS process</subject><subject>CMOS technology</subject><subject>CMOSFETs</subject><subject>Dynamic range</subject><subject>Heterogeneous Integration</subject><subject>Heterojunction bipolar transistors</subject><subject>III-V semiconductor materials</subject><subject>Indium phosphide</subject><subject>Semiconductor materials</subject><subject>Silicon</subject><subject>Space technology</subject><issn>0149-645X</issn><issn>2576-7216</issn><isbn>1424428033</isbn><isbn>9781424428038</isbn><isbn>1424428041</isbn><isbn>9781424428045</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2009</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNpFkM1OwkAcxNevREBfQC_7AsX9bntEgkICwQSMeiLb3X_bNWXbdIvRt7cqiZeZSWbyOwxCN5SMKSXp3epl87YaM0LSsaRKJqk8QUMqmBAsIYKeogGTsYpiRtXZf8H5ORoQKtJICfl6iYYhvBNCZELVAB0m9kN7AxaX0EFbF-ChPgTsfAdFqztXe1zneOGf8Px-i7W3eLpab_DG4Q5M6euqLhwEnNctLl1R4gbaPu9_mHjvPntwcIXXFdZNUznzSwxX6CLXVYDro4_Q88NsO51Hy_XjYjpZRo7GsouEpZxnIgWhWGJiKxlTLCM5TbhWwmqjYpOnACrLjDW2n8gMeAy9iJhxykfo9o_rAGDXtG6v26_d8Tv-DbBSYSc</recordid><startdate>200906</startdate><enddate>200906</enddate><creator>Gutierrez-Aitken, A.</creator><creator>Chang-Chien, P.</creator><creator>Wen Phan</creator><creator>Scott, D.</creator><creator>Oyama, B.</creator><creator>Sandhu, R.</creator><creator>Zhou, J.</creator><creator>Nam, P.</creator><creator>Hennig, K.</creator><creator>Parlee, M.</creator><creator>Poust, B.</creator><creator>Khanh Thai</creator><creator>Geiger, C.</creator><creator>Oki, A.</creator><creator>Kagiwada, R.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>200906</creationdate><title>Advanced heterogeneous integration of InP HBT and CMOS Si technologies for high performance mixed signal applications</title><author>Gutierrez-Aitken, A. ; Chang-Chien, P. ; Wen Phan ; Scott, D. ; Oyama, B. ; Sandhu, R. ; Zhou, J. ; Nam, P. ; Hennig, K. ; Parlee, M. ; Poust, B. ; Khanh Thai ; Geiger, C. ; Oki, A. ; Kagiwada, R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i175t-4d133b49e4628c7d52262b0f183a64dac67cf9ee6bbcdcd8c75be37ebe3472313</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Analog-digital conversion</topic><topic>Bandwidth</topic><topic>CMOS process</topic><topic>CMOS technology</topic><topic>CMOSFETs</topic><topic>Dynamic range</topic><topic>Heterogeneous Integration</topic><topic>Heterojunction bipolar transistors</topic><topic>III-V semiconductor materials</topic><topic>Indium phosphide</topic><topic>Semiconductor materials</topic><topic>Silicon</topic><topic>Space technology</topic><toplevel>online_resources</toplevel><creatorcontrib>Gutierrez-Aitken, A.</creatorcontrib><creatorcontrib>Chang-Chien, P.</creatorcontrib><creatorcontrib>Wen Phan</creatorcontrib><creatorcontrib>Scott, D.</creatorcontrib><creatorcontrib>Oyama, B.</creatorcontrib><creatorcontrib>Sandhu, R.</creatorcontrib><creatorcontrib>Zhou, J.</creatorcontrib><creatorcontrib>Nam, P.</creatorcontrib><creatorcontrib>Hennig, K.</creatorcontrib><creatorcontrib>Parlee, M.</creatorcontrib><creatorcontrib>Poust, B.</creatorcontrib><creatorcontrib>Khanh Thai</creatorcontrib><creatorcontrib>Geiger, C.</creatorcontrib><creatorcontrib>Oki, A.</creatorcontrib><creatorcontrib>Kagiwada, R.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Gutierrez-Aitken, A.</au><au>Chang-Chien, P.</au><au>Wen Phan</au><au>Scott, D.</au><au>Oyama, B.</au><au>Sandhu, R.</au><au>Zhou, J.</au><au>Nam, P.</au><au>Hennig, K.</au><au>Parlee, M.</au><au>Poust, B.</au><au>Khanh Thai</au><au>Geiger, C.</au><au>Oki, A.</au><au>Kagiwada, R.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Advanced heterogeneous integration of InP HBT and CMOS Si technologies for high performance mixed signal applications</atitle><btitle>2009 IEEE MTT-S International Microwave Symposium Digest</btitle><stitle>MWSYM</stitle><date>2009-06</date><risdate>2009</risdate><spage>1109</spage><epage>1112</epage><pages>1109-1112</pages><issn>0149-645X</issn><eissn>2576-7216</eissn><isbn>1424428033</isbn><isbn>9781424428038</isbn><eisbn>1424428041</eisbn><eisbn>9781424428045</eisbn><abstract>Northrop Grumman Space Technology (NGST) is developing an advanced heterogeneous integration (AHI) process to integrate III-V semiconductor chiplets on CMOS wafers under the compound semiconductor materials on silicon (COSMOS) DARPA program. The objective of the program is to have a heterogeneous interconnect pitch and length less than 5 um to enable intimate transistor scale integration. This integration will enable significant improvement in ADC dynamic range and bandwidth.</abstract><pub>IEEE</pub><doi>10.1109/MWSYM.2009.5165895</doi><tpages>4</tpages></addata></record>
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2576-7216
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Analog-digital conversion
Bandwidth
CMOS process
CMOS technology
CMOSFETs
Dynamic range
Heterogeneous Integration
Heterojunction bipolar transistors
III-V semiconductor materials
Indium phosphide
Semiconductor materials
Silicon
Space technology
title Advanced heterogeneous integration of InP HBT and CMOS Si technologies for high performance mixed signal applications
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-15T01%3A41%3A02IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Advanced%20heterogeneous%20integration%20of%20InP%20HBT%20and%20CMOS%20Si%20technologies%20for%20high%20performance%20mixed%20signal%20applications&rft.btitle=2009%20IEEE%20MTT-S%20International%20Microwave%20Symposium%20Digest&rft.au=Gutierrez-Aitken,%20A.&rft.date=2009-06&rft.spage=1109&rft.epage=1112&rft.pages=1109-1112&rft.issn=0149-645X&rft.eissn=2576-7216&rft.isbn=1424428033&rft.isbn_list=9781424428038&rft_id=info:doi/10.1109/MWSYM.2009.5165895&rft_dat=%3Cieee_6IE%3E5165895%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&rft.eisbn=1424428041&rft.eisbn_list=9781424428045&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=5165895&rfr_iscdi=true