A low cost and low power silicon npn bipolar process with NMOS transistors and its wireless applications

Microwave and dc characteristics, and wireless applications of a low cost and low power silicon bipolar process with NMOS transistors are described. The process features 25-GHz double-polysilicon self-aligned npn bipolar transistors with 5.5-V BV/sub CEO/, optional 0.7-/spl mu/m NMOS transistors wit...

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Hauptverfasser: O, K., Tewksbury, T., Dawe, G., Tsai, C., Garone, P., Scharf, B., Kermarrec, C., Yasaitis, J.
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:Microwave and dc characteristics, and wireless applications of a low cost and low power silicon bipolar process with NMOS transistors are described. The process features 25-GHz double-polysilicon self-aligned npn bipolar transistors with 5.5-V BV/sub CEO/, optional 0.7-/spl mu/m NMOS transistors with p/sup +/ polysilicon gate for switch applications, lateral pnp transistors, high and low valued resistors, inductors, and p/sup +/ polysilicon-to-n/sup +/ plug capacitors. The RF and microwave capabilities of the process up to several GHz are demonstrated by fabricating and characterizing RF amplifiers, low noise amplifiers, and RF switches.
DOI:10.1109/MTTTWA.1995.512332