An integrated thermo-capacitive type MOS flow sensor
A prototype of a new thermo-capacitive integrated flow sensor consisting of a floating-gate MOS transistor has been developed. Tantalum pentoxide is the dielectric material between the top (control) gate and the floating-gate. The temperature dependence of the dielectric constant is about 375 ppm//s...
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Veröffentlicht in: | IEEE electron device letters 1996-05, Vol.17 (5), p.247-249 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A prototype of a new thermo-capacitive integrated flow sensor consisting of a floating-gate MOS transistor has been developed. Tantalum pentoxide is the dielectric material between the top (control) gate and the floating-gate. The temperature dependence of the dielectric constant is about 375 ppm//spl deg/C. The process flow is compatible with standard MOS process and augmented to include a capacitor module and bulk micromachining. The output voltage change at the flow velocity of 20 m/s is about 26 mV at 57 mW of heater power. The sensitivity in the 0-4 m/s flow velocity region is 4.25 mV(m/s)/sup -1/. |
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ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/55.491844 |