An integrated thermo-capacitive type MOS flow sensor

A prototype of a new thermo-capacitive integrated flow sensor consisting of a floating-gate MOS transistor has been developed. Tantalum pentoxide is the dielectric material between the top (control) gate and the floating-gate. The temperature dependence of the dielectric constant is about 375 ppm//s...

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Veröffentlicht in:IEEE electron device letters 1996-05, Vol.17 (5), p.247-249
Hauptverfasser: Lin, Kwang Ming, Kwok, CheeYee, Huang, Ruey Shing
Format: Artikel
Sprache:eng
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Zusammenfassung:A prototype of a new thermo-capacitive integrated flow sensor consisting of a floating-gate MOS transistor has been developed. Tantalum pentoxide is the dielectric material between the top (control) gate and the floating-gate. The temperature dependence of the dielectric constant is about 375 ppm//spl deg/C. The process flow is compatible with standard MOS process and augmented to include a capacitor module and bulk micromachining. The output voltage change at the flow velocity of 20 m/s is about 26 mV at 57 mW of heater power. The sensitivity in the 0-4 m/s flow velocity region is 4.25 mV(m/s)/sup -1/.
ISSN:0741-3106
1558-0563
DOI:10.1109/55.491844