Realization of dot DFB lasers

Dot lasers with first-, second- and third-order gain coupled distributed feedback (DFB) gratings have been realized by low damage dry etching in combination with wet chemical etching and epitaxial over-growth. This technique allows above room temperature (RT) operation of dot DFB lasers with dot dia...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE photonics technology letters 1996-05, Vol.8 (5), p.587-589
Hauptverfasser: Griesinger, U.A., Schweizer, H., Kronmuller, S., Geiger, M., Ottenwalder, D., Scholz, F., Pilkuhn, M.H.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Dot lasers with first-, second- and third-order gain coupled distributed feedback (DFB) gratings have been realized by low damage dry etching in combination with wet chemical etching and epitaxial over-growth. This technique allows above room temperature (RT) operation of dot DFB lasers with dot diameters down to 85 nm. The laser spectra show the expected emission of gain coupled DFB lasers. Threshold current densities between 1.1 kA/cm/sup 2/ and 2.6 kA/cm/sup 2/ could be obtained depending on size of the active region. An improvement in T/sub 0/ could be demonstrated comparing 0-D/1-D/2-D lasers on the same wafer. Based on the dot grating geometry improvement of the side mode suppression ratio (SMSR) was observed for broad-area dot DFB lasers.
ISSN:1041-1135
1941-0174
DOI:10.1109/68.491547