Optical properties of ZrO2 films fabricated by ion beam sputtering deposition at low temperature

ZrO 2 films have been deposited on Si(100) by ion beam sputtering deposition (IBSD) at temperature T = 70degC. Film structure properties and ZrO 2 /Si interface were observed with reflection high energy electron diffraction (RHEED) and high resolution transmission electron microscopy (HRTEM). Optica...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Atuchin, V.V., Aliev, V.Sh, Kruchinin, V.N., Ramana, C.V.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Electron optics Energy resolution ion beam sputtering deposition Ion beams Optical diffraction Optical films Optical reflection Particle beam optics Semiconductor films Sputtering Temperature ZrO 2 /Si
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!