Optical properties of ZrO2 films fabricated by ion beam sputtering deposition at low temperature

Optical properties of ZrO2 films fabricated by ion beam sputtering deposition at low temperature

ZrO 2 films have been deposited on Si(100) by ion beam sputtering deposition (IBSD) at temperature T = 70degC. Film structure properties and ZrO 2 /Si interface were observed with reflection high energy electron diffraction (RHEED) and high resolution transmission electron microscopy (HRTEM). Optica...

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Bibliographische Detailangaben
Hauptverfasser: Atuchin, V.V., Aliev, V.Sh, Kruchinin, V.N., Ramana, C.V.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Electron optics
Energy resolution
ion beam sputtering deposition
Ion beams
Optical diffraction
Optical films
Optical reflection
Particle beam optics
Semiconductor films
Sputtering
Temperature
ZrO 2 /Si
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Zusammenfassung:ZrO 2 films have been deposited on Si(100) by ion beam sputtering deposition (IBSD) at temperature T = 70degC. Film structure properties and ZrO 2 /Si interface were observed with reflection high energy electron diffraction (RHEED) and high resolution transmission electron microscopy (HRTEM). Optical properties of the film were studied by spectroscopic ellipsometry over the spectral range 250-900 nm.
DOI:10.1109/IFOST.2007.4798650