Development of manufacture technological processes of complex profil silicon structures for VHF-devices

Results of study and development of technological processes of deep anisotropic etching of micromechanical elements (MME) of microelectromechanical systems (MEMS) for VHF devices are submitted.

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Hauptverfasser: Timoshenkov, S.P., Kalugin, V.V., Klochko, A.V., Kalugina, I.V., Prokop'ev, E.P.
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creator Timoshenkov, S.P.
Kalugin, V.V.
Klochko, A.V.
Kalugina, I.V.
Prokop'ev, E.P.
description Results of study and development of technological processes of deep anisotropic etching of micromechanical elements (MME) of microelectromechanical systems (MEMS) for VHF devices are submitted.
doi_str_mv 10.1109/CRMICO.2008.4676505
format Conference Proceeding
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Anisotropic magnetoresistance
Etching
IEEE catalog
Instruments
Manufacturing processes
Microwave technology
Organizing
Plasma applications
Silicon
title Development of manufacture technological processes of complex profil silicon structures for VHF-devices
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