Development of manufacture technological processes of complex profil silicon structures for VHF-devices

Development of manufacture technological processes of complex profil silicon structures for VHF-devices

Results of study and development of technological processes of deep anisotropic etching of micromechanical elements (MME) of microelectromechanical systems (MEMS) for VHF devices are submitted.

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Bibliographische Detailangaben
Hauptverfasser: Timoshenkov, S.P., Kalugin, V.V., Klochko, A.V., Kalugina, I.V., Prokop'ev, E.P.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Anisotropic magnetoresistance
Etching
IEEE catalog
Instruments
Manufacturing processes
Microwave technology
Organizing
Plasma applications
Silicon
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Beschreibung
Zusammenfassung:Results of study and development of technological processes of deep anisotropic etching of micromechanical elements (MME) of microelectromechanical systems (MEMS) for VHF devices are submitted.
DOI:10.1109/CRMICO.2008.4676505