Improved RF Power Performance in a 0.18- \mu\hbox MOSFET Which Uses an Asymmetric Drain Design
We have fabricated 0.18-mum asymmetric MOSFETs using a foundry-standard 1P6M process, without making any process modifications. In comparison with a conventional 0.18-mum MOSFET, the asymmetric MOSFET design leads to a 64% improvement in the saturated output power and 8 dB better adjacent channel po...
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Veröffentlicht in: | IEEE electron device letters 2008-12, Vol.29 (12), p.1402-1404 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We have fabricated 0.18-mum asymmetric MOSFETs using a foundry-standard 1P6M process, without making any process modifications. In comparison with a conventional 0.18-mum MOSFET, the asymmetric MOSFET design leads to a 64% improvement in the saturated output power and 8 dB better adjacent channel power ratio. The improvement in the RF power performance of these MOS transistors suggests that they should be suitable for medium power amplifiers. |
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ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/LED.2008.2007509 |