Improved RF Power Performance in a 0.18- \mu\hbox MOSFET Which Uses an Asymmetric Drain Design

We have fabricated 0.18-mum asymmetric MOSFETs using a foundry-standard 1P6M process, without making any process modifications. In comparison with a conventional 0.18-mum MOSFET, the asymmetric MOSFET design leads to a 64% improvement in the saturated output power and 8 dB better adjacent channel po...

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Veröffentlicht in:IEEE electron device letters 2008-12, Vol.29 (12), p.1402-1404
Hauptverfasser: Chang, T., Kao, H.L., McAlister, S.P., Horng, K.Y., Chin, A.
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Sprache:eng
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Zusammenfassung:We have fabricated 0.18-mum asymmetric MOSFETs using a foundry-standard 1P6M process, without making any process modifications. In comparison with a conventional 0.18-mum MOSFET, the asymmetric MOSFET design leads to a 64% improvement in the saturated output power and 8 dB better adjacent channel power ratio. The improvement in the RF power performance of these MOS transistors suggests that they should be suitable for medium power amplifiers.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2008.2007509